Simultaneous Dangling Bond and Zincophilic Site Engineering of SiNx Protective Coatings toward Stable Zinc Anodes

J Zheng, G Zhu, X Liu, H Xie, Y Lin, Y Zeng… - ACS Energy …, 2022 - ACS Publications
Metallic Zn is an appealing anode for aqueous Zn-ion batteries, but it suffers from corrosion
and Zn dendrites. In this work, we develop a nonstoichiometric silicon nitride (SiN x) film with …

[PDF][PDF] 微波ECR 等离子体增强磁控溅射制备SiNx 薄膜及其性能分析

丁万昱, 徐军, 李艳琴, 朴勇, 高鹏, 邓新绿, 董闯 - 物理学报, 2006 - wulixb.iphy.ac.cn
利用微波ECR 磁控反应溅射法在室温下制备无氢SiNx 薄膜. 通过傅里叶红外光谱, X
射线电子谱, 膜厚仪, 纳米硬度仪, 原子力显微镜等分析手段, 分析了N2 流量, Si …

Optimization of Silicon-Oxynitride Thin Films for Crystalline Silicon (c-Si) PERC Cell

HH Canar - 2022 - open.metu.edu.tr
PECVD deposited SiNx has been used in PV industry especially for PERC solar cell as anti-
reflection coating (ARC) and passivating layer [1]. However, its limited optical and electrical …

Preparation and characterization of silicon nitride (SiN)-coated carbon fibers and their effects on thermal properties in composites

HH Kim, W Han, H Lee, BG Min, BJ Kim - Materials Science and …, 2015 - Elsevier
This study investigates the effect of silicon nitride (Si single bond N)-coated carbon fibers on
the thermal conductivity of carbon-fiber-reinforced epoxy composite. The surface properties …

The effect of N2 flow rate on discharge characteristics of microwave electron cyclotron resonance plasma

WY Ding, J Xu, WQ Lu, XL Deng, C Dong - Physics of Plasmas, 2009 - pubs.aip.org
The properties of plasma in Ar/N 2 microwave electron cyclotron resonance discharge with a
percentage of N 2 flow rate ranging from 5% to 50% have been studied in order to …

Study on SiN and SiCN film production using PE-ALD process with high-density multi-ICP source at low temperature

H Song, S Seo, H Chang - Current Applied Physics, 2018 - Elsevier
SiN and SiCN film production using plasma-enhanced atomic layer deposition (PE-ALD) is
investigated in this study. A developed high-power and high-density multiple inductively …

[PDF][PDF] 线性微波化学气相沉积制备SiNx 薄膜的微结构及光学性能研究

张健, 巴德纯, 赵崇凌, 刘坤, 杜广煜 - 物理学报, 2015 - wulixb.iphy.ac.cn
利用自主研发的线性微波化学气相沉积系统在不同微波功率, 微波占空比, 基片温度,
特气比例条件下制备了SiNx 薄膜. 通过扫描电子显微镜, 椭圆偏振仪等表征测量技术 …

Ultra-thin α-SiNx protective overcoats for hard disks and read/write heads

D Wan-Yu, X Jun, L Wen-Qi, D Xin-Lu… - Chinese Physics …, 2009 - iopscience.iop.org
This paper reports that amorphous silicon nitride (a-SiN x) overcoats were deposited at room
temperature by microwave ECR plasma enhanced unbalanced magnetron sputtering. The 2 …

Influence of N2 flow rate on the mechanical properties of SiNx films deposited by microwave electron cyclotron resonance magnetron sputtering

W Ding, J Xu, W Lu, X Deng, C Dong - Thin solid films, 2010 - Elsevier
Hydrogen-free amorphous silicon nitride (SiNx) films were deposited at room temperature by
microwave electron cyclotron resonance plasma-enhanced unbalance magnetron …

Room temperature deposition process for manufacturing silicon nitride films using pulsed plasma and neural network

D Kim, B Kim, D Han, NG Yoon - Materials and Manufacturing …, 2011 - Taylor & Francis
As a deposition layer, silicon nitride (SiN) films are widely used in manufacturing silicon
solar cells. To develop a cost-effective manufacturing process, deposition processes at …