Solar energy absorption mediated by surface plasma polaritons in spectrally selective dielectric-metal-dielectric coatings: a critical review

A Dan, HC Barshilia, K Chattopadhyay… - … and Sustainable Energy …, 2017 - Elsevier
The effective use of solar energy has become significantly important due to unnatural
weather changes and fossil fuel exhaustion. Concentrating Solar Power (CSP) technology is …

A study on structural, optical and hydrophobic properties of oblique angle sputter deposited HfO2 films

RK Jain, YK Gautam, V Dave, AK Chawla… - Applied surface …, 2013 - Elsevier
HfO 2 thin films have been synthesized by oblique angle reactive DC magnetron sputtering
technique. Present study reports the effect of deposition angle on the hydrophobic …

Total Ionization Dose Effects on Charge-Trapping Memory With Al2O3/HfO2/Al2O3 Trilayer Structure

JS Bi, YN Xu, GB Xu, HB Wang… - IEEE Transactions on …, 2017 - ieeexplore.ieee.org
This paper investigates total ionization dose (TID) effects on the electrical characteristics of
Al 2 O 3/HfO 2/Al 2 O 3-based charge trapping memory (CTM) devices by 10-keV X-ray. The …

Synergic Impacts of CF4 Plasma Treatment and Post-thermal Annealing on the Nonvolatile Memory Performance of Charge-Trap-Assisted Memory Thin-Film Transistors Using …

JJ Kim, SM Yoon - ACS Applied Electronic Materials, 2022 - ACS Publications
Charge-trap-assisted memory thin-film transistors (CTM-TFTs) using the engineered Al-
doped HfO2 (Al: HfO2) CTL and In–Ga–Zn–O channel were fabricated and characterized to …

Charge-Trapping-Type Flash Memory Device With Stacked High- Charge-Trapping Layer

PH Tsai, KS Chang-Liao, TC Liu… - IEEE electron device …, 2009 - ieeexplore.ieee.org
Operating properties of charge-trapping-type Flash memory devices with single or stacked
structures on trapping layer are investigated in this letter. Improved operation and reliability …

The Reliability Impact of Bi Doping on the HfO2 Charge-Trapping Layer: A First-Principles Study

F Ye, Y Zhu, JH Yuan, J Wang - Journal of Electronic Materials, 2024 - Springer
Hafnia has emerged as a promising material for charge-trapping memory. However,
enhancing its trapping performance remains a significant research challenge. In this work …

Charge Trapping in amorphous dielectrics for secure charge storage

SJ Baik, H Shin - ACS Applied Materials & Interfaces, 2021 - ACS Publications
The fundamental scientific ingredient in the current information society is charge trapping in
dielectric materials. The current data storage device known as NAND flash is based on …

High-κ HfO2 nanocrystal memory capacitors prepared by phase separation of atomic-layer-deposited HfO2∕ Al2O3 nanomixtures

S Maikap, A Das, TY Wang, TC Tien… - Journal of the …, 2009 - iopscience.iop.org
Physical and electrical characteristics of atomic-layer-deposited high-κ nanocrystals in a at
elevated temperature have been investigated. Because the phase separation of high-κ …

Charge Trapping Memory Characteristics of p-Si/Ultrathin Al2O3∕(HfO2) 0.8 (Al2O3) 0.2∕ Al2O3/Metal Multilayer Structure

Z Tang, Y Xia, H Xu, J Yin, Z Liu, A Li… - … and Solid-State …, 2010 - iopscience.iop.org
Memory properties of p-Si/ultrathin/metal capacitors have been investigated, in which all the
high-dielectric films were derived by atomic layer deposition technique. Using a film as the …

Progress of high-k dielectrics applicable to SONOS-type nonvolatile semiconductor memories

Z Tang, Z Liu, X Zhu - Transactions on Electrical and Electronic …, 2010 - koreascience.kr
As a promising candidate to replace the conventional floating gate flash memories,
polysilicon-oxide-nitride-oxidesilicon (SONOS)-type nonvolatile semiconductor memories …