[HTML][HTML] A review on the GaN-on-Si power electronic devices

Y Zhong, J Zhang, S Wu, L Jia, X Yang, Y Liu… - Fundamental …, 2022 - Elsevier
The past decades have witnessed a tremendous development of GaN-based power
electronic devices grown on Si substrate. This article provides a concise introduction …

Recent advances in GaN‐based power HEMT devices

J He, WC Cheng, Q Wang, K Cheng… - Advanced electronic …, 2021 - Wiley Online Library
The ever‐increasing power density and operation frequency in electrical power conversion
systems require the development of power devices that can outperform conventional Si …

Multi-channel nanowire devices for efficient power conversion

L Nela, J Ma, C Erine, P Xiang, TH Shen, V Tileli… - Nature …, 2021 - nature.com
Nanowire-based devices can potentially be of use in a variety of electronic applications,
from ultrascaled digital circuits to 5G communication networks. However, the devices are …

Dynamic on-resistance in GaN power devices: Mechanisms, characterizations, and modeling

S Yang, S Han, K Sheng… - IEEE Journal of Emerging …, 2019 - ieeexplore.ieee.org
Gallium nitride (GaN) power devices enable power electronic systems with enhanced power
density and efficiency. Dynamic on-resistance (R ON) degradation (or current collapse) …

Ultrathin-barrier AlGaN/GaN heterostructure: A recess-free technology for manufacturing high-performance GaN-on-Si power devices

S Huang, X Liu, X Wang, X Kang… - … on Electron Devices, 2017 - ieeexplore.ieee.org
(Al) GaN recess-free normally OFF technology is developed for fabrication of high-yield
lateral GaN-based power devices. The recess-free process is achieved by an ultrathin …

1300 V normally-OFF p-GaN gate HEMTs on Si with high ON-state drain current

H Jiang, Q Lyu, R Zhu, P Xiang… - IEEE Transactions on …, 2020 - ieeexplore.ieee.org
In this article, we demonstrate normally-OFF p-GaN gate high electron mobility transistors
(HEMTs) on Si with an ultrahigh breakdown voltage () and excellent saturation drain current …

OFF-State Drain-Voltage-Stress-Induced VTH Instability in Schottky-Type p-GaN Gate HEMTs

J Chen, M Hua, J Wei, J He, C Wang… - IEEE Journal of …, 2020 - ieeexplore.ieee.org
In this article, we systematically investigate the OFF-state drain-voltage-stress-induced
threshold voltage () instability in Schottky-type p-GaN gate high electron mobility transistors …

High-voltage p-GaN HEMTs with off-state blocking capability after gate breakdown

H Jiang, R Zhu, Q Lyu, KM Lau - IEEE Electron Device Letters, 2019 - ieeexplore.ieee.org
In this letter, we report high-performance p-GaN HEMTs on Si with robust gate operation. For
the first time, the preserved OFF-state drain blocking capability has been demonstrated in p …

Enhancement-Mode GaN MOS-HEMTs With Recess-Free Barrier Engineering and High- ZrO2 Gate Dielectric

H Jiang, CW Tang, KM Lau - IEEE Electron Device Letters, 2018 - ieeexplore.ieee.org
Enhancement-mode GaN MOS-HEMTs with a uniform threshold voltage (V th~ 2.2±0.25 V at
ID= 1 μA/mm) have been achieved by a recess-free barrier engineering technique in …

InAlN/GaN HEMT on Si with fmax= 270 GHz

P Cui, M Jia, H Chen, G Lin, J Zhang… - … on Electron Devices, 2021 - ieeexplore.ieee.org
Device surface properties are critical for its performance such as channel electron density,
leakage current, subthreshold swing (SS), and noise in gallium nitride high-electron-mobility …