In recent years, many novel sensing nanomaterials were explored experimentally and
theoretically as chemical gas sensors to detect sulphur hexafluoride (SF6) decomposed …

Black TiO2 materials have been quite widely explored due to their large solar absorption
and superior photocatalytic activity. In this paper, the blackening process of titanium dioxide …

A global model has been developed for low-pressure, inductively coupled plasma (ICP) SF
6/O 2/Ar mixtures. This model is based on a set of mass balance equations for all the …

ZnO nanostructure films were deposited by radio frequency (RF) magnetron sputtering on
etched silicon (100) substrates using dry Ar/SF6 plasma, at two etching times of 5 min and …

In this paper, we demonstrate the optimization of a capacitively coupled plasma etching for
the fabrication of a polysilicon waveguide with smooth sidewalls and low optical loss. A …

In this work, mass spectrometry and optical emission spectroscopy techniques were used to
monitor the molecular and atomic neutral species during SF 6/CF 4, SF 6/O 2 and CF 4/O 2 …

Technical plasmas have a wide range of industrial applications. The Encyclopedia of
Plasma Technology covers all aspects of plasma technology from the fundamentals to a …

This study is dedicated to the development of a multiscale approach for the simulation of
silicon etching using the Bosch process. The etching simulator is composed of three …

The grid-assisted magnetron sputtering is a variation of the magnetron sputtering commonly
used for thin film deposition. In this work, Langmuir probe measurements were performed in …

Amorphous silicon carbide (a-SiC) films hold promise for microelectronic and MEMS
devices. Prior to their use in microfabricated devices, these films undergo plasma etching …