High Power Impulse Magnetron Sputtering (HiPIMS) is a coating technology that combines
magnetron sputtering with pulsed power concepts. By applying power in pulses of high …

This paper reviews the present understanding of electrolytic plasma processes (EPPs) and
approaches to their modelling. Based on the EPP type, characteristics and classification, it …

Ion irradiation is a key tool for controlling the nanostructure, phase content, and physical
properties of refractory ceramic thin films grown at low temperatures by magnetron …

Low temperature plasma (LTP)-based synthesis of advanced materials has played a
transformational role in multiple industries, including the semiconductor industry, liquid …

In this study, photoactive Cu x O/TiO 2 coatings were prepared using magnetron sputtering
operated at different powers and modes (Direct-current magnetron sputtering and High …

Sputter deposition of atoms onto liquid substrates aims at producing colloidal dispersions of
small monodisperse ultrapure nanoparticles (NPs). Since sputtering onto liquids combines …

Up until recently, thin film growth by magnetron sputtering relied on enhancing adatom
mobility in the surface region by gas-ion irradiation to obtain dense layers at low deposition …

The influence of energetic species on thin film growth mechanism is a long-term issue in the
field of low-pressure plasma-based magnetron sputtering technology. Several species may …

This work is devoted to the identification properties of indium tin oxide (ITO) thin films
responsible for their possible application in combined optical and electrochemical label-free …

Time-resolved characterization of an Ar-Ti high-power impulse magnetron sputtering
discharge has been performed. This paper deals with two-dimensional density mapping in …