Thin films of Si nanocrystals (Si NCs) embedded in a silicon carbide (SiC) matrix (Si-NC:
SiC) were prepared by alternating deposition of Si-rich silicon carbide (Si1− xCx) and near …

In this paper simulated single and double layer anti-reflective coatings based on the
refractive index limits of silicon nitride (SiN) and silicon oxide (SiO/sub 2/) are presented …

Plasma enhanced chemical vapor deposition (PECVD) was applied to the fabrication of
hexamethyldisiloxane (HMDSO) derived amorphous silica membranes. Three different …

Silicon has been the subject of an extensive research effort aimed at developing new anode
materials for lithium ion batteries due to its large specific and volumetric capacity. However …

Depositing an antireflection coating on the front surface of solar cells allows a significant
reduction in reflection losses. It thus allows an increase in the efficiency of the cells. A …

Silicon nitride (SiNx: H) thin films were grown on silicon by the plasma-enhanced chemical
vapor deposition (PECVD) method at low temperature in order to study their optical …

In this work we review our new methods to computer generate amorphous atomic topologies
of several binary alloys: SiH, SiN, CN; binary systems based on group IV elements like SiC; …

The optical properties and etch rates of silicon nitride (SiNx: H) deposited by plasma-
enhanced chemical vapour deposition (PECVD) and their correlation with bond …

On top of a crystalline silicon wafer, heterojunction solar cells have a thin layer of
amorphous silicon (a-Si) placed on it. The efficiency of heterojunction solar cells can be …

We have performed the deposition of silicon nitride thin films with the DC reactive magnetron
sputtering technique from a silicon target in an Ar/NH3 gas mixture. Usually, the control of …