Analyzing and understanding the structure and morphology of crystalline polymers has been
and remains to be a major challenge. Some of the issues have resisted analyses for …

Block copolymers have garnered significant attention in the past few decades due to their
ability to self-assemble into nanoscale structures (∼ 10–100 nm), making them ideal for …

Molecular self-assembling block copolymers (BCPs) have shown promise as a next
generation bottom-up lithography technology. However, a critical step in advancing this …

Block copolymer (BCP) microphase separation at surfaces might enable the generation of
substrate features in a scalable, manufacturable, bottom-up fashion provided that pattern …

A simple method to create a variety of nanostructures via the self-assembly of a single
composition silicon-containing block copolymer (BCP) is developed. By using selective …

Monolayer 2D MoS2 grown by chemical vapor deposition is nanopatterned into nanodots,
nanorods, and hexagonal nanomesh using block copolymer (BCP) lithography. The detailed …

While equilibrium block-copolymer morphologies are dictated by energy-minimization
effects, the semi-ordered states observed experimentally often depend on the details of …

Block copolymer (BCP) thin films have shown high potential as a pattern transfer medium for
ultra-fine (< 20 nm) features. We introduce an effective approach for performing rapid local …

Here, we report all-polymer polysiloxane composites that overcome the long-standing
processing problems of silica-reinforced silicone rubbers. Polystyrene fillers are dispersed …

The structure of thin microphase-separated polystyrene-block-polydimethylsiloxane (PS–
PDMS) films has been studied using state-of-the-art top-down and cross-sectional electron …