High-energy-density pinch plasma: A unique nonconventional tool for plasma nanotechnology
RS Rawat - IEEE Transactions on Plasma Science, 2013 - ieeexplore.ieee.org
Low-temperature (<; 10 eV) plasmas with densities varying over a very wide range from 10
13 m-3 at the lower end to as high as 10 23 m-3 have firmly established themselves as one …
13 m-3 at the lower end to as high as 10 23 m-3 have firmly established themselves as one …
Dense plasma focus-from alternative fusion source to versatile high energy density plasma source for plasma nanotechnology
RS Rawat - Journal of Physics: Conference Series, 2015 - iopscience.iop.org
The dense plasma focus (DPF), a coaxial plasma gun, utilizes pulsed high current electrical
discharge to heat and compress the plasma to very high density and temperature with …
discharge to heat and compress the plasma to very high density and temperature with …
Research with plasma foci in countries of Asia, Africa, and Latin America
AE Dubinov, EI Fomicheva, LA Senilov - Reviews of Modern Plasma …, 2020 - Springer
This paper considers the modern level of technique, research, and application of “plasma
focus” facilities in the countries of Asia, Africa, and Latin America. A description of the …
focus” facilities in the countries of Asia, Africa, and Latin America. A description of the …
Deposition of zirconium carbonitride composite films using ion and electron beams emitted from plasma focus device
Nanocrystalline zirconium carbonitride (ZrCN) composite films were deposited on zirconium
substrates for multiple (10, 20, 30, 40 and 50) focus shots. X-ray diffraction analysis shows …
substrates for multiple (10, 20, 30, 40 and 50) focus shots. X-ray diffraction analysis shows …
Effect of anode designs on ion emission characteristics of a plasma focus device
A comparative study on the ion emission characteristics such as flux and energy, and their
variation in angular positions and operating gas pressures has been carried out in a …
variation in angular positions and operating gas pressures has been carried out in a …
[HTML][HTML] Experimental investigation and simulation of penetration depth of nitrogen ions emitted by plasma focus device inside titanium samples
MMR Seyedhabashi, M Ebrahimi, D Rostamifard… - Results in Physics, 2023 - Elsevier
The plasma focus device is a simple, inexpensive, and precious device that can be
considered as a source of high-energy ions for researches relevant to interactions of ions …
considered as a source of high-energy ions for researches relevant to interactions of ions …
Nitrogen ion implantation of silicon in dense plasma focus
A low energy (1.45 kJ) Mather type plasma focus device is used for nitrogen ion implantation
in mono-crystalline silicon. The silicon specimens are exposed to different number of focus …
in mono-crystalline silicon. The silicon specimens are exposed to different number of focus …
Plasma focus assisted carburizing of aluminium
G Murtaza, SS Hussain, M Sadiq, M Zakaullah - Thin Solid Films, 2009 - Elsevier
Carburizing of aluminium using the energetic carbon ions emitted from a low energy (1.45
kJ) Mather type plasma focus device operated with methane is reported. The aluminium …
kJ) Mather type plasma focus device operated with methane is reported. The aluminium …
Synthesis of nano-crystalline zirconium aluminium oxynitride (ZrAlON) composite films by dense plasma Focus device
Zirconium aluminium oxynitride multiphase composite film is deposited on zirconium
substrate using energetic nitrogen ions delivered from dense plasma Focus device. X-ray …
substrate using energetic nitrogen ions delivered from dense plasma Focus device. X-ray …
Synthesis and characterization of magnesium aluminate (MgAl2O4) spinel (MAS) thin films
In a quest to identify more economic routes for synthesis of magnesium aluminate (MgAl 2 O
4) spinel (MAS) thin films, dense plasma focus device was used with multiple plasma focus …
4) spinel (MAS) thin films, dense plasma focus device was used with multiple plasma focus …