Mie scattering is increasingly exploited to manipulate electromagnetic fields to achieve
strong resonant enhancement, to obtain perfect absorption of radiation, and to generate …

Micro-optics is an indispensable key enabling technology for many products and
applications today. Probably the most prestigious examples are the diffractive light shaping …

The limitation of projection microstereolithography in additive manufacturing methods is that
they typically use a single-aperture imaging configuration, which restricts their ability to …

A new illumination system for mask aligner lithography is presented. The illumination system
uses two subsequent microlens-based Köhler integrators. The second Köhler integrator is …

By means of experiment and simulation, we achieve unprecedented insights into the
formation of Talbot images to be observed in transmission for light diffracted at wavelength …

Various micro-to-nanometer scale structures are extremely attractive for light escaping in
organic light-emitting diodes. To develop and optimize such structures, an innovative …

We theoretically predict and numerically simulate the discrete plasmonic Talbot effect in
dielectric graphene plasmonic waveguide (DGPW) arrays at THz wavelengths. The super …

We report on the observation and correction of an imaging artifact attributed to the Talbot
effect in the context of acousto-optic imaging using structured acoustic waves. When …

This article reviews modeling approaches for optical and extreme ultraviolet (EUV)
projection lithography. It explains the models for the rigorous computation of light diffraction …

The application of the phase-shift method allows a significant resolution enhancement for
proximity lithography in mask aligners. Typically a resolution of 3 µm (half-pitch) at a …