Metallic nanogaps with metal–metal separations of less than 10 nm have many applications
in nanoscale photonics and electronics. However, their fabrication remains a considerable …

We report on the fabrication and characterization of high-resolution gratings with high
efficiency in the extreme ultraviolet (EUV) and soft x-ray ranges using spin-on-carbon (SOC) …

Metasurfaces with complex periodic nanoarrays have attracted a large amount of attention
over the past decades due to their pronounced plasmonic and photonic properties. Though …

Achromatic Talbot lithography (ATL) with high resolution has been demonstrated to be an
excellent technique for large area periodic nano-fabrication. In this work, the uniformity of …

Since 2019, EUV lithography with a wavelength of 13.5 nm has been used for the mass
production of 7 nm+ node semiconductor logic devices, and pattern processing of 16-nm …

Based on the coherent radiation from an undulator source, extreme UV interference
lithography (EUV-IL) technology is considered as the leading candidate for future nodes of …