Creating design rule clean layouts for digital circuit designs can be facilitated by the use of
standard cell layouts as building blocks, and placement and routing tools that are extended …

Roughly described, a system enables quick and accurate depiction to a user of multi-
patterning layout violations so that they may be corrected manually and in real time, and …

Roughly described, a design rule data set is developed offline from the design rules of a
target fabrication process. A design rule checking method involves traversing the corners of …

In a multiple patterning techniques, where two or more expo Sures are used to form a single
layer of a device, the splitting of features in a single layer between the multiple exposures is …

Roughly described, while manually dragging shapes during IC layout editing, editing
operations determine which edges of which shapes are moving at what speed ratios. Based …

Abstract As nanometer Very Large Scale Integration (VLSI) demands more transistor density
to fabricate multi-cores and memory blocks in a limited die size, many researches have been …

Design rule has been a primary metric to link design and technology, and is likely to be
considered as IC manufacturer's role for the generation due to the empirical and …

A layout decomposition in Double Patterning Lithography (DPL) is considered to be
potential for processing nodes at or below 32 nm. In this method, two features are assigned …

Manufacturing of VLSI chips in the sub-wavelength technology using the conventional
lithography has become extremely challenging. A major reason for this is the difficulty to …