Template for self assembly and method of making a self assembled pattern
J Kim, WAN Jinxiu, S Miyazaki, G Lin, H Wu - US Patent 10,457,088, 2019 - Google Patents
US10457088B2 - Template for self assembly and method of making a self assembled
pattern - Google Patents US10457088B2 - Template for self assembly and method of …
pattern - Google Patents US10457088B2 - Template for self assembly and method of …
Method of producing structure containing phase-separated structure, method of forming pattern, and top coat material
T Matsumiya, T Seshimo, K Ohmori, K Miyagi… - US Patent …, 2015 - Google Patents
A method of producing a structure containing a phase-separated structure, including
forming, on a substrate, a layer containing a block copolymer having a block of a polyhedral …
forming, on a substrate, a layer containing a block copolymer having a block of a polyhedral …
Underlayer composition for promoting self assembly and method of making and using
H Wu, J Yin, G Lin, J Kim, J Shan - US Patent 9,093,263, 2015 - Google Patents
US9093263B2 - Underlayer composition for promoting self assembly and method of making and
using - Google Patents US9093263B2 - Underlayer composition for promoting self assembly and …
using - Google Patents US9093263B2 - Underlayer composition for promoting self assembly and …
Compositions of neutral layer for directed self assembly block copolymers and processes thereof
H Wu, Y Cao, SE Hong, J Yin, M Paunescu… - US Patent …, 2015 - Google Patents
The present invention relates to novel processes for using the neutral layer compositions for
aligning microdomains of directed self-assembling block copolymers (BCP). The processes …
aligning microdomains of directed self-assembling block copolymers (BCP). The processes …
Methods and materials for removing metals in block copolymers
J Yin, H Wu, M Thiyagarajan, SE Hong… - US Patent …, 2015 - Google Patents
The present invention relates to a method for treating a block copolymer solution, wherein
the method comprises: providing a solution comprising a block copolymer in a non aqueous …
the method comprises: providing a solution comprising a block copolymer in a non aqueous …
Self-organization material and pattern formation method
Y Seino, N Kihara - US Patent 9,835,947, 2017 - Google Patents
A self-organization material according to an embodiment includes a block copolymer and a
top coat material. The block copolymer contains a first block and a second block. The …
top coat material. The block copolymer contains a first block and a second block. The …
Method for producing a planar polymer stack
X Chevalier - US Patent 11,454,880, 2022 - Google Patents
The invention relates to a method for manufacturing a flat polymeric stack, said stack
comprising one or more first and one second layer of (co) polymer (20, 30) stacked one on …
comprising one or more first and one second layer of (co) polymer (20, 30) stacked one on …
Polymer compositions for self-assembly applications
H Wu, J Yin, G Lin - US Patent 11,518,730, 2022 - Google Patents
The present invention relates to a composition comprises at least one random copolymer
having at least one repeat unit of structure (1), The present invention also relates to novel …
having at least one repeat unit of structure (1), The present invention also relates to novel …
Procede de fabrication d'un empilement polymerique plan
X CHEVALIER, I Iliopoulos - 2019 - Google Patents
WO2019102158A1 - Procede de fabrication d'un empilement polymerique plan - Google Patents
WO2019102158A1 - Procede de fabrication d'un empilement polymerique plan - Google Patents …
WO2019102158A1 - Procede de fabrication d'un empilement polymerique plan - Google Patents …