Improved Electrical Properties of AlGaN/GaN High-Electron-Mobility Transistors by In Situ Tailoring the SiNx Passivation Layer

A Siddique, R Ahmed, J Anderson… - … Applied Materials & …, 2021 - ACS Publications
In situ metal–organic chemical vapor deposition growth of SiN x passivation layers is
reported on AlGaN/GaN high-electron-mobility transistors (HEMTs) without surface damage …

Effects of the cap layer on the properties of AlN barrier HEMT grown on 6-inch Si (111) substrate

Y Xia, Y Zhu, C Liu, H Wei, T Zhang… - Materials Research …, 2020 - iopscience.iop.org
A series of AlN/GaN heterostructures were grown on 150 mm Si substrates by metal organic
chemical vapor deposition (MOCVD). Different cap layer structures, including gallium nitride …

Screening effects on the mobility properties in AlGaN/GaN heterostructures with varied Al content

Z Yarar, D Cesur, MD Alyörük, HC Çekil… - … Journal of Modern …, 2022 - World Scientific
The electron mobility at a AlGaN/GaN heterostructure is calculated using an ensemble
Monte Carlo (MC) technique where the emphasis is primarily given to screening effects and …

Probing the effects of surface roughness and barrier layer thickness in InAlGaN/GaN HEMTs to improve carrier mobility

J Yaita, A Yamada, N Nakamura… - Applied Physics …, 2021 - iopscience.iop.org
In this study, we investigated the effects of the thickness and surface roughness of InAlGaN
barrier layers on the electron mobility of InAlGaN/GaN high-electron-mobility transistors …

A structural analysis of ultrathin barrier (In) AlN/GaN heterostructures for GaN‐based high‐frequency power electronics

P Narin, E Kutlu‐Narin, G Atmaca… - Surface and …, 2022 - Wiley Online Library
Metal–organic chemical vapor deposition (MOCVD) is one of the best growth methods for
GaN‐based materials as well‐known. GaN‐based materials with very quality are grown the …