Nanoscale hard X-ray microscopy methods for materials studies

M Holt, R Harder, R Winarski… - Annual Review of …, 2013 - annualreviews.org
This review discusses recent progress in the development of hard X-ray microscopy
techniques for materials characterization at the nanoscale. Although the utility of traditionally …

Four-dimensional scanning transmission electron microscopy (4D-STEM): From scanning nanodiffraction to ptychography and beyond

C Ophus - Microscopy and Microanalysis, 2019 - cambridge.org
Scanning transmission electron microscopy (STEM) is widely used for imaging, diffraction,
and spectroscopy of materials down to atomic resolution. Recent advances in detector …

A review of micro-scale focused ion beam milling and digital image correlation analysis for residual stress evaluation and error estimation

AJG Lunt, AM Korsunsky - Surface and coatings technology, 2015 - Elsevier
In the past decade several versions of micro-scale residual stress analysis techniques have
been developed based on Focused Ion Beam (FIB) milling at sample surface followed by …

High-resolution elastic strain measurement from electron backscatter diffraction patterns: New levels of sensitivity

AJ Wilkinson, G Meaden, DJ Dingley - Ultramicroscopy, 2006 - Elsevier
In this paper, we demonstrate that the shift between similar features in two electron
backscatter diffraction (EBSD) patterns can be measured using cross-correlation based …

[HTML][HTML] Strain mapping at nanometer resolution using advanced nano-beam electron diffraction

VB Ozdol, C Gammer, XG Jin, P Ercius… - Applied Physics …, 2015 - pubs.aip.org
We report on the development of a nanometer scale strain mapping technique by means of
scanning nano-beam electron diffraction. Only recently possible due to fast acquisition with …

Nanoscale holographic interferometry for strain measurements in electronic devices

M Hÿtch, F Houdellier, F Hüe, E Snoeck - Nature, 2008 - nature.com
Strained silicon is now an integral feature of the latest generation of transistors and
electronic devices,, because of the associated enhancement in carrier mobility,. Strain is …

Patterned probes for high precision 4D-STEM bragg measurements

SE Zeltmann, A Müller, KC Bustillo, B Savitzky… - Ultramicroscopy, 2020 - Elsevier
Nanoscale strain mapping by four-dimensional scanning transmission electron microscopy
(4D-STEM) relies on determining the precise locations of Bragg-scattered electrons in a …

[HTML][HTML] Strain mapping of semiconductor specimens with nm-scale resolution in a transmission electron microscope

D Cooper, T Denneulin, N Bernier, A Béché… - Micron, 2016 - Elsevier
The last few years have seen a great deal of progress in the development of transmission
electron microscopy based techniques for strain mapping. New techniques have appeared …

Strain measurement at the nanoscale: Comparison between convergent beam electron diffraction, nano-beam electron diffraction, high resolution imaging and dark …

A Béché, JL Rouvière, JP Barnes, D Cooper - Ultramicroscopy, 2013 - Elsevier
Convergent beam electron diffraction (CBED), nano-beam electron diffraction (NBED or
NBD), high resolution imaging (HRTEM and HRSTEM) and dark field electron holography …

Direct Mapping of Strain in a Strained Silicon Transistor<? format?> by High-Resolution Electron Microscopy

F Hüe, M Hÿtch, H Bender, F Houdellier, A Claverie - Physical review letters, 2008 - APS
Aberration-corrected high-resolution transmission electron microscopy (HRTEM) is used to
measure strain in a strained-silicon metal-oxide-semiconductor field-effect transistor. Strain …