Nanoimprint lithography (NIL) is a nonconventional lithographic technique for high‐
throughput patterning of polymer nanostructures at great precision and at low costs. Unlike …

Nanoimprint is an emerging lithographic technology that promises high-throughput
patterning of nanostructures. Based on the mechanical embossing principle, nanoimprint …

In the past decade, the feature size in ultra large-scale integration (ULSI) has been
continuously decreasing, leading to nanostructure fabrication. Nowadays, various …

This review provides a survey of lithography techniques and the resist materials employed
with these techniques. The first part focuses on the conventional lithography methods used …

A low pressure (2∼ 3 bar) nanoimprint lithography technique is developed that utilizes a
thin fluoropolymer film (∼ 100 μm) mold. The flexible film mold allows imprinting of …

This review concentrates on the applications of nanoimprint lithography (NIL) and hot
embossing for the fabrications of nanolectronic devices, nanophotonic metamaterials and …

Hydrogen silsesquioxane (HSQ) is used as a high-resolution resist with resolution down
below 10 nm half-pitch. This material or materials with related functionalities could have …

Although step-and-flash imprint lithography, or S-FIL, has brought about tremendous
advancement in wafer-scale fabrication of sub-100 nm features of photopolymerizable …

Advancements in photopolymers have led to groundbreaking achievements in the
electronics, print, optical engineering, and medical fields. At present, photopolymers have …

We theoretically investigate optical birefringence originating from subwavelength structures
in intrinsic birefringent media. Assuming alternating layers of isotropic and anisotropic …