Control of the Orientation of Symmetric Poly(styrene)-block-poly(d,l-lactide) Block Copolymers Using Statistical Copolymers of Dissimilar Composition
The interactions of block copolymers with surfaces can be controlled by coating those
surfaces with appropriate statistical copolymers. Usually, a statistical copolymer comprised …
surfaces with appropriate statistical copolymers. Usually, a statistical copolymer comprised …
Parallel arrays of sub-10 nm aligned germanium nanofins from an in situ metal oxide hardmask using directed self-assembly of block copolymers
High-mobility materials and non-traditional device architectures are of key interest in the
semiconductor industry because of the need to achieve higher computing speed and low …
semiconductor industry because of the need to achieve higher computing speed and low …
Nano-confinement of block copolymers in high accuracy topographical guiding patterns: Modelling the emergence of defectivity due to incommensurability
Extreme ultraviolet interference lithography (EUV-IL) is used to manufacture topographical
guiding patterns to direct the self-assembly of block copolymers. High-accuracy silicon oxide …
guiding patterns to direct the self-assembly of block copolymers. High-accuracy silicon oxide …
Selective etching of polylactic acid in poly(styrene)‐block‐poly(d,l)lactide diblock copolymer for nanoscale patterning
C Cummins, P Mokarian‐Tabari… - Journal of Applied …, 2014 - Wiley Online Library
Self‐assembled thin films of a lamellar forming polystyrene‐block‐poly (d, l) lactide (PS‐b‐
PLA) block copolymer (BCP) contain a “reactive” block that can be readily removed to …
PLA) block copolymer (BCP) contain a “reactive” block that can be readily removed to …
Self-assembly of block copolymers by graphoepitaxy
In the fabrication of a desired block copolymer (BCP) nanostructure for a particular
application, a key challenge is the control of the BCP microdomain assembly. Graphoepitaxy …
application, a key challenge is the control of the BCP microdomain assembly. Graphoepitaxy …
Healing LER using directed self assembly: treatment of EUVL resists with aqueous solutions of block copolymers
Overcoming the resolution-LER-sensitivity trade-off is a key challenge for the development
of novel resists and processes that are able to achieve the ITRS targets for future lithography …
of novel resists and processes that are able to achieve the ITRS targets for future lithography …
Polyelectrolyte multilayer-like films from layer-by-layer processing of protected polyampholytic block copolymers
JK Park, J Zhang, R Roy, S Ge… - Chemical Communications, 2018 - pubs.rsc.org
Polyelectrolyte multilayer films (PEMs) are conventionally prepared by a layer-by-layer (LbL)
deposition of alternating polycation and polyanion solutions. We introduce herein a block …
deposition of alternating polycation and polyanion solutions. We introduce herein a block …
Improvement in electron-beam lithography throughput by exploiting relaxed patterning fidelity requirements with directed self-assembly
HY Yu, CH Liu, YT Shen, HP Lee… - Alternative Lithographic …, 2014 - spiedigitallibrary.org
Line edge roughness (LER) influencing the electrical performance of circuit components is a
key challenge for electronbeam lithography (EBL) due to the continuous scaling of …
key challenge for electronbeam lithography (EBL) due to the continuous scaling of …
PMMA removal selectivity to PS using dry etch approach for sub-10nm node applications
A Sarrazin, P Pimenta-Barros… - 2015 China …, 2015 - ieeexplore.ieee.org
Directed Self-Assembly (DSA) of Block Copolymers (BCP) is one of the most promising
alternative lithography techniques for sub-10 nm nodes. In this paper, we propose to study …
alternative lithography techniques for sub-10 nm nodes. In this paper, we propose to study …
Lithographically produced features
The present invention relates to a method for modifying line edge roughness on a
lithographically-produced feature in a material, the method comprising applying a block …
lithographically-produced feature in a material, the method comprising applying a block …