Transparent heat regulating (THR) materials and coatings for energy saving window applications: Impact of materials design, micro-structural, and interface quality on …
This review highlights the development of energy saving transparent heat regulating (THR)
materials and coating for energy saving window applications. Current state-of-the-art …
materials and coating for energy saving window applications. Current state-of-the-art …
Thermionic Vacuum Arc—A versatile technology for thin film deposition and its applications
This review summarizes the more-than-25-years of development of the so-called thermionic
vacuum arc (TVA). TVA is an anodic arc discharge in vapors of the material to be deposited; …
vacuum arc (TVA). TVA is an anodic arc discharge in vapors of the material to be deposited; …
ZnO thin film synthesis by reactive radio frequency magnetron sputtering
In this study, ZnO thin films were deposited on glass substrates by reactive RF magnetron
sputtering method at argon–oxygen gas mixing (1: 1) atmosphere. Some properties of the …
sputtering method at argon–oxygen gas mixing (1: 1) atmosphere. Some properties of the …
Modification of properties of yttria stabilized zirconia epitaxial thin films by excimer laser annealing
R Bayati, R Molaei, A Richmond, S Nori… - … applied materials & …, 2014 - ACS Publications
This study focuses on the ultrafast improvement of surface wettability, electrical, and room
temperature magnetic characteristics of cubic zirconia single crystalline thin films after laser …
temperature magnetic characteristics of cubic zirconia single crystalline thin films after laser …
Comparative study of zirconium-zinc oxide thin films on ceramic and glass substrates: Structural, optical, and photocatalytic properties
This study investigates the structural, optical, and photocatalytic properties of zirconium-
doped zinc oxide (Zr) thin films deposited on ceramic and glass substrates. X-ray diffraction …
doped zinc oxide (Zr) thin films deposited on ceramic and glass substrates. X-ray diffraction …
Room-temperature atomic layer deposition of ZrO2 using tetrakis (ethylmethylamino) zirconium and plasma-excited humidified argon
K Kanomata, K Tokoro, T Imai, P Pansila, M Miura… - Applied Surface …, 2016 - Elsevier
Room-temperature atomic layer deposition (ALD) of ZrO 2 is developed with tetrakis
(ethylmethylamino) zirconium (TEMAZ) and a plasma-excited humidified argon. A growth …
(ethylmethylamino) zirconium (TEMAZ) and a plasma-excited humidified argon. A growth …
Optical properties and microstructure of ZrO2 thin films deposited by RF magnetron sputtering: case study on effects of different working temperatures
R Shakoury, A Arman, S Miri, M Mardani… - Optical and Quantum …, 2022 - Springer
Today, there is a great interest and desire to design and build thin films with morphologies
that meet different applications and needs, especially in the field of optics, surface science …
that meet different applications and needs, especially in the field of optics, surface science …
The electrical, elemental, optical, and surface properties of Si-doped ZnO thin films prepared by thermionic vacuum arc
R Mohammadigharehbagh, S Özen… - Materials Research …, 2017 - iopscience.iop.org
The purpose of this work is to study the properties of Si-doped ZnO (SZO) thin films, which
were prepared using the non-reactive thermionic vacuum arc technique. The analysis of the …
were prepared using the non-reactive thermionic vacuum arc technique. The analysis of the …
Optical characterization of deposited ITO thin films on glass and PET substrates
This work focuses on fabrication, characterization and understanding some physical
properties of transparent and conductive ITO thin films. ITO thin films were deposited onto …
properties of transparent and conductive ITO thin films. ITO thin films were deposited onto …
Structural, electrical, and decorative properties of sputtered zirconium thin films during post-annealing process
Zirconium thin films were deposited on a glass substrate using direct current magnetron
sputtering technique and then post-annealed at different temperatures (100° C to 500° C in …
sputtering technique and then post-annealed at different temperatures (100° C to 500° C in …