Efficient and secure intellectual property (IP) design with split fabrication
Split fabrication, the process of splitting an IC into an untrusted and trusted tier, facilitates
access to the most advanced semiconductor manufacturing capabilities available in the …
access to the most advanced semiconductor manufacturing capabilities available in the …
Sub-20 nm design technology co-optimization for standard cell logic
K Vaidyanathan, L Liebmann… - 2014 IEEE/ACM …, 2014 - ieeexplore.ieee.org
Efficiency and manufacturability of standard cell logic is critical for an IC, as standard cells
are at the heart of the nexus between technology definition, circuit design and physical …
are at the heart of the nexus between technology definition, circuit design and physical …
Design implications of extremely restricted patterning
K Vaidyanathan, R Liu, L Liebmann… - Journal of Micro …, 2014 - spiedigitallibrary.org
Escalating manufacturing cost and complexity is challenging the premise of affordable
scaling. With lithography accounting for a large fraction of wafer costs, researchers are …
scaling. With lithography accounting for a large fraction of wafer costs, researchers are …
Exploiting sub-20-nm complementary metal-oxide semiconductor technology challenges to design affordable systems-on-chip
K Vaidyanathan, Q Zhu, L Liebmann… - Journal of Micro …, 2015 - spiedigitallibrary.org
For the past four decades, cost and features have driven complementary metal-oxide
semiconductor (CMOS) scaling. Severe lithography and material limitations seen below the …
semiconductor (CMOS) scaling. Severe lithography and material limitations seen below the …
Logic IP for low-cost IC design in advanced CMOS nodes
MM Isgenc, MGA Martins, VM Zackriya… - … Transactions on Very …, 2019 - ieeexplore.ieee.org
Routing closure and design-for-manufacturability (DFM) challenges exacerbate
nonrecurring engineering (NRE) costs, a steep barrier to entry for advanced sub-20-nm …
nonrecurring engineering (NRE) costs, a steep barrier to entry for advanced sub-20-nm …
Revolutionizing Semiconductor Technology: A Comprehensive Review of FinFET
Theneedfor 3-Dimensional multiple-gate “MOSFETs”, such as “FinFETs”, has risen in recent
years. FinFET is a Double Gated (DG) MOS device that provides good performance since it …
years. FinFET is a Double Gated (DG) MOS device that provides good performance since it …
Enabling design of low-volume high-performance ICs
MM Isgenc - 2019 - search.proquest.com
Integrated circuits (ICs) are ubiquitous, ranging from consumer electronics to custom
hardware. While scaling of CMOS feature sizes has enabled faster and smaller ICs …
hardware. While scaling of CMOS feature sizes has enabled faster and smaller ICs …
[PDF][PDF] A Novel Design Methodology for Synthesizing Application-Specific Logic-in-Memory Blocks
HE Sumbul - 2015 - pstorage-cmu-348901238291901.s3 …
As the fraction of integrated circuit area dedicated to embedded memory continues to
increase, the energy spent for transporting data on-chip becomes increasingly larger than …
increase, the energy spent for transporting data on-chip becomes increasingly larger than …