Computers and other electronic devices are an integral and ubiquitous part of the modern
world. One of the key drivers for the development, power, cost, and availability of these …

Negative-tone molecular resists are organic small molecule resists that can be
lithographically patterned in the negative tone. This chapter examines a wide variety of …

Negative tone resists based on cross-linking via epoxide/cationic polymerization have a
variety of potential advantages over more traditional positive tone resists based on …

A resist imaging design that utilizes photoacid inhibition of cationic polymerization and cross-
linking during a postexposure bake step has been studied. The key to the design approach …

Line pattern collapse (LPC) becomes a critical concern as integrated circuit fabrication
continues to advance towards the 22 nm node and below. Tokyo Electron Limited (TEL) has …

Critical aspect ratio induced pattern collapse has been a concern for lithography process
engineers since before the 180 nm node. This line bending can lead to pattern deformation …

The work of University of Wisconsin [3, 4](Dr. Bohme, Dr. de Pablo, Dr. Yoshimoto, et. al.),
NIST [5](Dr. Stafford, et. al.), and most recently at GT [6](Wei-Ming Yeh, et. al) have all …

As the challenges of next generation lithography have increased it has become increasingly
difficult to maintain progress with traditional photoresists. A substantial research effort in to …