Computers and other electronic devices are an integral and ubiquitous part of the modern
world. One of the key drivers for the development, power, cost, and availability of these …

Negative-tone molecular resists are organic small molecule resists that can be
lithographically patterned in the negative tone. This chapter examines a wide variety of …

Negative tone resists based on cross-linking via epoxide/cationic polymerization have a
variety of potential advantages over more traditional positive tone resists based on …

Many different types of non-traditional resist designs have shown promise for future
generations of patterning, but there is a greater need for understanding and developing …

Overcoming the resolution-LER-sensitivity trade-off is a key challenge for the development
of novel resists and processes that are able to achieve the ITRS targets for future lithography …

Conventional chemically amplified resists have several issues that can potentially limit their
capability for sub-40 nm imaging. One of the major issues at this size scale is that the …

Directed self-assembly (DSA) is a promising technique for extending conventional
lithographic techniques by being able to print features with critical dimensions under 10 nm …

A negative tone, aqueous base developable molecular glass resist, 3Ep, is presented that is
developable in both standard organic solvents and aqueous base developers. The resist …

Glass transition is an extremely important phenomenon in condensed physics. It greatly
affects the physical property of materials. In this paper, we divide molecular structures into …