Diffusion in photoresists is a fundamental process that significantly impacts micro-nano
manufacturing. However, it often intertwines with chemical reactions, leading to intricate …

Polymeric chemically amplified resists (CARs) are critical materials for high-throughput
lithographic processes. A photoactivated acid-anion catalyst changes the polymer's …

We developed “reactive” bottlebrush polymers based on styrene (S) and t-butyl acrylate
(tBA) as additives for polystyrene (PS) coatings. The bottlebrush polymers spontaneously …

The acid-catalyzed deprotection of glassy polymer resins is an important process in
semiconductor lithography. Studies have shown that the reaction kinetics in these materials …

To achieve high volume manufacturing, EUV photoresists need to push back the" RLS trade-
off" by simultaneously improving Resolution, Line-Width Roughness and Sensitivity …

In chemically amplified resists (CARs), it is known that catalyst diffusion is accelerated by the
deprotection reaction. However, the mechanisms that drive this enhancement are not yet …

Optical projection lithography involves the transfer of a photomask pattern onto a polymer
material known as a photoresist. The diffracted light from the exposed photomask is …

Catalyst diffusion is a critical component of the pattern formation process in chemically
amplified resists (CARs). In this study, we used a concerted experimental and modeling …

Chemically amplified resists (CARs) are a class of lithographic materials that enable high-
throughput semiconductor patterning. CARs are comprised of a glassy polymer resin …