Well-defined model systems are needed for better understanding of the relationship
between optical, electronic, magnetic, and catalytic properties of nanoparticles and their …

Investigations to evaluate the extreme ultraviolet (EUV) lithographic performance of 160 nm
thick poly (methyl methacrylate) with 13.5 nm wavelength EUV light were performed using a …

Extreme ultraviolet interference lithography (EUV-IL) is a relatively simple and inexpensive
technique that can pattern high-resolution line/space and has been successfully used for the …

Evaluating the comprehensive characteristics of extreme ultraviolet (EUV) photoresists is
crucial for their application in EUV lithography, a key process in modern technology. This …

Different from well-established and highly refined fabrication processes in EO 1.0, the
fabrication techniques in EO 2.0 are still imperfect, which need to be carefully investigated to …

Polarized light plays a significant role in various modern applications such as sunglasses,
display technologies, navigation, and optical communications, which involve multiple …

Extreme ultraviolet interference lithography (EUV-IL) is relatively simple and inexpensive
technique that can pattern high resolution line/space and has been successfully used for the …

Well-defined model systems are needed for better understanding of the relationship
between optical, electronic, magnetic, and catalytic properties of these nanoparticles and …

Nanowires have attracted much interest due to their materials properties, such as decreased
thermal conductivity, enhanced optical absorption, and quantum size effects to name a few …

Catalysts, which are often nano-sized metal nanoparticles, are of vital importance in
largescale production of fuels and chemicals, in energy conversion processes and in efforts …