Study and analysis of advanced 3D multi-gate junctionless transistors

R Kumar, S Bala, A Kumar - Silicon, 2022 - Springer
As the IC technology is evolving very rapidly, the feature size of the device has been
migrating to sub-nanometre regime for achieving the high packing density. To continue with …

History and evolution of CMOS technology and its application in semiconductor industry

MH Bhuyan - 2017 - dspace.aiub.edu
For around five decades, the size of the transistors has been shrinking, and thus the number
of transistors in a single microelectronic chip has become possible to increase …

18nm n-channel and p-channel Dopingless asymmetrical Junctionless DG-MOSFET: low power CMOS based digital and memory applications

N Mendiratta, SL Tripathi - Silicon, 2022 - Springer
In this paper, an 18nm dopingless asymmetrical junctionless (AJ) double gate (DG)
MOSFET has been designed for suppressed short channel effects (SCEs) for low power …

Dual- Independent-Gate FinFETs for Low Power Logic Circuits

M Rostami, K Mohanram - IEEE Transactions on Computer …, 2011 - ieeexplore.ieee.org
This paper describes the electrode work-function, oxide thickness, gate-source/drain
underlap, and silicon thick ness optimization required to realize dual-V th independent-gate …

Surface potential modeling of graded-channel gate-stack (GCGS) high-K dielectric dual-material double-gate (DMDG) MOSFET and analog/RF performance study

V Narendar, KA Girdhardas - silicon, 2018 - Springer
In each complementary metal-oxide-semiconductor (CMOS) technology generation, design
of new device architectures at nanoscale regime becomes quite challenging task due to …

Channel length scaling pattern for cylindrical surrounding double-gate (CSDG) MOSFET

MA Uchechukwu, VM Srivastava - IEEE access, 2020 - ieeexplore.ieee.org
The natural length of MOSFETs helps to describe the potential distribution in the Silicon
substrate. This natural length varies in different device structures, from a single gate to multi …

[HTML][HTML] A two-dimensional analytical model for short channel junctionless double-gate MOSFETs

C Jiang, R Liang, J Wang, J Xu - AIP Advances, 2015 - pubs.aip.org
A physics-based analytical model of electrostatic potential for short-channel junctionless
double-gate MOSFETs (JLDGMTs) operated in the subthreshold regime is proposed, in …

A two-dimensional model for the potential distribution and threshold voltage of short-channel double-gate metal-oxide-semiconductor field-effect transistors with a …

S Dubey, PK Tiwari, S Jit - Journal of Applied Physics, 2010 - pubs.aip.org
A two-dimensional (2D) model for the threshold voltage of the short-channel double-gate
(DG) metal-oxide-semiconductor field-effect transistors (MOSFETs) with a vertical Gaussian …

An accurate model for threshold voltage analysis of dual material double gate metal oxide semiconductor field effect transistor

H Chakrabarti, R Maity, S Baishya, NP Maity - Silicon, 2021 - Springer
In this article, an accurate representation of threshold voltage for double metal double gate
(DMDG) device structure has been initiated. It is the lowest gate-source electromotive force …

Compact model of drain current in short-channel triple-gate FinFETs

N Fasarakis, A Tsormpatzoglou… - IEEE transactions on …, 2012 - ieeexplore.ieee.org
An analytical compact drain current model for undoped (or lightly doped) short-channel triple-
gate fin-shaped field-effect transistors (finFETs) is presented, taking into account quantum …