Abstract In recent years Ion Beam Sputtering (IBS) has revealed itself as a powerful
technique to induce surface nanopatterns with a large number of potential applications …

Nanopatterning of solid surfaces by low-energy ion bombardment has received
considerable interest in recent years. This interest was partially motivated by promising …

When collimated beams of low energy ions are used to bombard materials, the surface often
develops a periodic pattern or “ripple” structure. Different types of patterns are observed to …

We study the self-organized ordering of nanostructures produced by ion-beam sputtering of
targets amorphizing under irradiation. By introducing a model akin to models of pattern …

A continuum model, based on the damped Kuramoto-Sivashinsky equation, is shown to
reproduce the morphology evolution during ion sputtering quite successfully. In a very …

Surface nanopatterning induced by ion beam irradiation (IBI) has emerged as an effective
nanostructuring technique since it induces patterns on large areas of a wide variety of …

Abstract 3D integration enhances RC delay mitigation, improves inter-die bandwidth, and
has routing advantages for the next generation integrated circuit technology. To realize the …

The production of self-organized surface nanopatterns by ion beam sputtering (IBS) at low (<
10 keV) and intermediate (10–100 keV) energies has emerged in the last decade as a …

We report on the selective production of self-organized nanohole and nanodot patterns on
Si (001) surfaces by ion beam sputtering (IBS) under normal-incidence of 1 keV Ar+ ions …

We demonstrate that 3 keV ion beams, formed from the common noble gases, He, Ne, Ar, Kr,
and Xe, can controllably “sculpt” nanometer scale pores in silicon nitride films. Single …