Defect scattering is well known to suppress thermal transport. In this study, however, we
perform both molecular dynamics and Boltzmann transport equation calculations, to …

The increasing demand for optics quality requires the lowest optical power loss, which can
occur from unwanted reflections. Laser direct writing (LDW) allows for the fabrication of …

In many nano (opto) electronic devices, the roughness at surfaces and interfaces is of
increasing importance, with roughness often contributing toward losses and defects, which …

The recent advancement of semiconductor devices to the near-atomic scale necessitated
the development of atomic layer processing methods, including molecular layer deposition …

In this work, thermal atomic layer deposition (ALD) was used to synthesize vanadium (V)-
doped TiO 2 thin nanofilm on polypropylene (PP) hernia meshes. Multiple layers of (Al 2 O …

Objectives Zirconia is an important dental implant material, yet it surfaces milling method is
still under investigation. To explore the feasibility of laser etching in processing fine micro …

Hf x Zr1− x O2 (HZO) thin films have excellent potential for application in various devices,
including ferroelectric transistors and semiconductor memories. However, such applications …

The stabilization of metal–oxide-bound molecular catalysts is essential for enhancing their
lifetime and commercial viability in heterogeneous catalysis. This is particularly relevant in …

Atomic layer deposition (ALD) and atomic layer etching (ALE) techniques were used to
control the ZrO 2 shell thickness on TiO 2/ZrO 2 core/shell nanoparticles. ALD and ALE were …

The aim of this study was to determine the electronic properties of as-deposited ALD-grown
Ge-doped zinc oxide thin films annealed at 523 K or 673 K. SEM, EDS, and ellipsometry …