Advances in top–down and bottom–up surface nanofabrication: Techniques, applications & future prospects

A Biswas, IS Bayer, AS Biris, T Wang, E Dervishi… - Advances in colloid and …, 2012 - Elsevier
This review highlights the most significant advances of the nanofabrication techniques
reported over the past decade with a particular focus on the approaches tailored towards the …

Transport phenomena in nanofluidics

RB Schoch, J Han, P Renaud - Reviews of modern physics, 2008 - APS
The transport of fluid in and around nanometer-sized objects with at least one characteristic
dimension below 100 nm enables the occurrence of phenomena that are impossible at …

Nanoimprint lithography: methods and material requirements

LJ Guo - Advanced materials, 2007 - Wiley Online Library
Nanoimprint lithography (NIL) is a nonconventional lithographic technique for high‐
throughput patterning of polymer nanostructures at great precision and at low costs. Unlike …

[HTML][HTML] Nanoimprint lithography steppers for volume fabrication of leading-edge semiconductor integrated circuits

SV Sreenivasan - Microsystems & nanoengineering, 2017 - nature.com
This article discusses the transition of a form of nanoimprint lithography technology, known
as Jet and Flash Imprint Lithography (J-FIL), from research to a commercial fabrication …

Nanoimprint lithography: An old story in modern times? A review

H Schift - Journal of Vacuum Science & Technology B …, 2008 - pubs.aip.org
Nanoimprint lithography (NIL) is a high throughput, high-resolution parallel patterning
method in which a surface pattern of a stamp is replicated into a material by mechanical …

Nanoimprint lithography: Emergent materials and methods of actuation

LM Cox, AM Martinez, AK Blevins, N Sowan, Y Ding… - Nano Today, 2020 - Elsevier
Shortly after its inception, nanoimprint lithography (NIL) was primarily used as tool for the
thermal embossing and flash curing of thermoplastic resists and polymer precursors …

Recent progress in nanoimprint technology and its applications

LJ Guo - Journal of Physics D: Applied Physics, 2004 - iopscience.iop.org
Nanoimprint is an emerging lithographic technology that promises high-throughput
patterning of nanostructures. Based on the mechanical embossing principle, nanoimprint …

Technologies for nanofluidic systems: top-down vs. bottom-up—a review

D Mijatovic, JCT Eijkel, A Van den Berg - Lab on a Chip, 2005 - pubs.rsc.org
This paper gives an overview of the most commonly used techniques for nanostructuring
and nanochannel fabrication employed in nanofluidics. They are divided into two large …

Differential regulation of stiffness, topography, and dimension of substrates in rat mesenchymal stem cells

Z Li, Y Gong, S Sun, Y Du, D Lü, X Liu, M Long - Biomaterials, 2013 - Elsevier
The physiological microenvironment of the stem cell niche, including the three factors of
stiffness, topography, and dimension, is crucial to stem cell proliferation and differentiation …

Simulation and experimental study of polymer deformation in nanoimprint lithography

Y Hirai, T Konishi, T Yoshikawa… - Journal of Vacuum Science …, 2004 - pubs.aip.org
A polymer deformation process is studied by numerical simulations and the results are
compared with the related experimental results in nanoimprint lithography. The imprint …