[HTML][HTML] Optical wafer defect inspection at the 10 nm technology node and beyond
The growing demand for electronic devices, smart devices, and the Internet of Things
constitutes the primary driving force for marching down the path of decreased critical …
constitutes the primary driving force for marching down the path of decreased critical …
Development of a broadband Mueller matrix ellipsometer as a powerful tool for nanostructure metrology
Ellipsometric scatterometry has gained wide industrial applications in semiconductor
manufacturing after ten years of development. Among the various types of ellipsometers …
manufacturing after ten years of development. Among the various types of ellipsometers …
Machine learning aided solution to the inverse problem in optical scatterometry
Optical scatterometry is the workhorse technique for in-line manufacturing process control in
the semiconductor industry. However, as manufacturing processes develop, traditional …
the semiconductor industry. However, as manufacturing processes develop, traditional …
Mueller matrix imaging ellipsometry for nanostructure metrology
In order to achieve effective process control, fast, inexpensive, nondestructive and reliable
nanometer scale feature measurements are extremely useful in high-volume …
nanometer scale feature measurements are extremely useful in high-volume …
[HTML][HTML] Generic characterization method for nano-gratings using deep-neural-network-assisted ellipsometry
As a non-destructive and rapid technique, optical scatterometry has gained widespread use
in the measurement of film thickness and optical constants. The recent advances in deep …
in the measurement of film thickness and optical constants. The recent advances in deep …
Regularized pseudo-phase imaging for inspecting and sensing nanoscale features
Recovering tiny nanoscale features using a general optical imaging system is challenging
because of poor signal to noise ratio. Rayleigh scattering implies that the detectable signal …
because of poor signal to noise ratio. Rayleigh scattering implies that the detectable signal …
Condition-number-based measurement configuration optimization for nanostructure reconstruction by optical scatterometry
The quality of the measured signature is influenced not only by the instrument's precision but
also by the selected measurement configuration. In optical scatterometry, the purpose of …
also by the selected measurement configuration. In optical scatterometry, the purpose of …
Automatic feature selection in EUV scatterometry
P Ansuinelli, WMJ Coene, HP Urbach - Applied Optics, 2019 - opg.optica.org
Scatterometry is an important nonimaging and noncontact method for optical metrology. In
scatterometry certain parameters of interest are determined by solving an inverse problem …
scatterometry certain parameters of interest are determined by solving an inverse problem …
Improved deep-etched multilayer grating reconstruction by considering etching anisotropy and abnormal errors in optical scatterometry
Accurate, fast, and nondestructive reconstruction of the etched nanostructures is important
for etching process control to achieve good fidelity, as well as high manufacturing yield. In …
for etching process control to achieve good fidelity, as well as high manufacturing yield. In …
Inverse optical scatterometry using sketch-guided deep learning
Optical scatterometry, also referred to as optical critical dimension (OCD) metrology, is a
widely used technique for characterizing nanostructures in semiconductor industry. As a …
widely used technique for characterizing nanostructures in semiconductor industry. As a …