Reinventing high performance computing: challenges and opportunities

D Reed, D Gannon, J Dongarra - arXiv preprint arXiv:2203.02544, 2022 - arxiv.org
The world of computing is in rapid transition, now dominated by a world of smartphones and
cloud services, with profound implications for the future of advanced scientific computing …

Hpc forecast: Cloudy and uncertain

D Reed, D Gannon, J Dongarra - Communications of the ACM, 2023 - dl.acm.org
HPC Forecast: Cloudy and Uncertain Page 1 Today, that economic and technological
influence has increasingly shifted to smartphone and cloud service companies. Moreover …

Sub-5 nm Gate-All-Around InP Nanowire Transistors toward High-Performance Devices

L Xu, L Xu, Q Li, S Fang, Y Li, Y Guo… - ACS Applied …, 2023 - ACS Publications
The gate-all-around (GAA) nanowire (NW) field-effect transistor (FET) is a promising device
architecture due to its superior gate controllability compared to that of the conventional …

Design and simulation of vertically-stacked nanowire transistors at 3 nm technology nodes

S Dey, J Jena, E Mohapatra, TP Dash, S Das… - Physica …, 2019 - iopscience.iop.org
Abstract Gate-all-around (GAA) cylindrical Si channel nanowire field-effect transistor (NW-
FET) devices have the potential to replace FinFETs in future technology nodes because of …

Design, optimization, and analysis of Si and GaN nanowire FETs for 3 nm technology

RR Thakur, N Chaturvedi - Semiconductor Science and …, 2021 - iopscience.iop.org
Nanowires, due to their unique properties, are emerging as the building blocks of the next-
generation electronics industry and will play a critical role in both low-and high-performance …

Evaluation of nanosheet and forksheet width modulation for digital IC design in the sub-3-nm era

G Sisto, O Zografos, B Chehab… - IEEE transactions on …, 2022 - ieeexplore.ieee.org
In this article, we provide a comprehensive evaluation of width modulation capabilities of
both nanosheet (NS) and forksheet (FS) devices, going from device level to a block level …

Analysis of Nanosheet Field Effect Transistor (NSFET) for device and circuit perspective

P Kumar, S Yadav, PK Pal - 2019 Women Institute of …, 2019 - ieeexplore.ieee.org
This paper presents an analysis of Nanosheet Field Effect Transistor (NSFET) and Nanowire
FET for device and circuit perspective with 7nm channel length. While simulating the above …

Gate-All-Around GaN Nanowire FET as a Potential Transistor at 5 nm Technology for Low-Power Low-Voltage Applications

RR Thakur, N Chaturvedi - Nano, 2021 - World Scientific
In this paper, design and parameter optimization for the performance analysis of a Gate-All-
Around GaN Nanowire Field Effect Transistor (GAA GaN NWFET) has been carried out …

Ohmic contact to monolayer semiconductors

PC Shen - 2020 - dspace.mit.edu
Finally, we provide a deeper understanding of the ohmic contact nature at metal-monolayer
semiconductor interfaces and propose a new contact paradigm, gap-state saturation, to …

IEEE copyright form

MZ Baten, MA Kumar, A Padovani, L Larcher… - ieeexplore.ieee.org
The IEEE distributes its technical publications throughout the world and wants to ensure that
the material submitted to its publications is properly available to the readership of those …