Tunable Synaptic Characteristics of a Ti/TiO2/Si Memory Device for Reservoir Computing

J Yang, H Cho, H Ryu, M Ismail… - ACS Applied Materials …, 2021 - ACS Publications
In this study, we fabricate and characterize a Ti/TiO2/Si device with different dopant
concentrations on a silicon surface for neuromorphic systems. We verify the device stack …

Multi-level Cells and Quantized Conductance Characteristics of Al2O3-Based RRAM Device for Neuromorphic System

Y Lee, J Park, D Chung, K Lee, S Kim - Nanoscale Research Letters, 2022 - Springer
Recently, various resistance-based memory devices are being studied to replace charge-
based memory devices to satisfy high-performance memory requirements. Resistance …

[HTML][HTML] Retention enhancement through capacitance-dependent voltage division analysis in 3D stackable TaOx/HfO2-based selectorless memristor

JH Sung, JH Park, DS Jeon, D Kim, MJ Yu, AC Khot… - Materials & Design, 2021 - Elsevier
Sneak path current generated by adjacent cells in three-dimensional (3D) memristor arrays
must be curbed while securing the multi-bit storage capability of each cell to aid in the cost …

Short-term memory characteristics in n-type-ZnO/p-type-NiO heterojunction synaptic devices for reservoir computing

H So, JK Lee, S Kim - Applied Surface Science, 2023 - Elsevier
We investigated the short-term memory characteristics of n-type-ZnO/p-type-NiO
heterojunction-based memristor devices to achieve a reservoir computing system. The …

Laser-Fabricated reduced graphene oxide memristors

FJ Romero, A Toral-Lopez, A Ohata, DP Morales… - Nanomaterials, 2019 - mdpi.com
Finding an inexpensive and scalable method for the mass production of memristors will be
one of the key aspects for their implementation in end-user computing applications. Herein …

Effect of Annealing Temperature for Ni/AlOx/Pt RRAM Devices Fabricated with Solution-Based Dielectric

Z Shen, Y Qi, IZ Mitrovic, C Zhao, S Hall, L Yang, T Luo… - Micromachines, 2019 - mdpi.com
Resistive random access memory (RRAM) devices with Ni/AlOx/Pt-structure were
manufactured by deposition of a solution-based aluminum oxide (AlOx) dielectric layer …

Resistive switching behaviours of Pt/Ni0. 5Zn0. 5Fe2O4/Pt based on film thickness for memristor applications

L Zhang, B Xie, W Chen, L Fan, H Zheng, Q Wu… - Ceramics …, 2023 - Elsevier
Abstract In this work, Pt/Ni 0.5 Zn 0.5 Fe 2 O 4/Pt (Pt/NZFO/Pt) sandwich structure material
with different NZFO film thicknesses were synthesised on an Al 2 O 3 substrate using the …

Unconventional Inorganic‐Based Memristive Devices for Advanced Intelligent Systems

SH Sung, DH Kim, TJ Kim, IS Kang… - Advanced Materials …, 2019 - Wiley Online Library
The latest progresses in software engineering such as cloud computing, big data analysis,
and machine learning have accelerated the emergence of advanced intelligent systems …

Unipolar resistive switching behavior in Al2O3/HfO2 multilayer dielectric stacks: fabrication, characterization and simulation

M Maestro-Izquierdo, MB Gonzalez… - …, 2020 - iopscience.iop.org
In this work, the impact of different HfO 2/Al 2 O 3-based multilayer dielectric stack (DS)
configurations on the electrical characteristics and on the resistive switching (RS) …

A Self-Rectifying Resistive Switching Device Based on HfO2/TaO Bilayer Structure

H Ma, X Zhang, F Wu, Q Luo, T Gong… - … on Electron Devices, 2018 - ieeexplore.ieee.org
To effectively solve the crosstalk issue in high-density crossbar array (CBA), high rectifying
characteristics should be introduced in the resistance random-access memory (ReRAM) …