In this paper, a comparative study of the early growth stages of aluminum oxide (Al2O3) thin
dielectric layers deposited by thermal-(T-ALD) and plasma-enhanced atomic layer …

Salt hydrates are commonly used as buffer materials in thermal storage applications. One of
the major problems usually encountered is corrosion issues related with the heat exchanger …

Obtaining high-temperature thermal stable solar selective absorbing coatings is a big
challenge for ultra-high temperature solar-thermal conversion applications. In this paper, a …

The optical emission spectroscopy (OES) data provide multi-featured and high-dimension
data, which exhibit rich physical phenomena. The novel unsupervised learning uniform …

A set of aluminium nitride (AlN) and oxidized AlN (AlNO) thin films were grown with the
technique of direct current (dc) reactive magnetron sputtering. The main purpose of this …

Aluminum nitride thin films were deposited on Si (100) substrate by pulsed DC (asymmetric
bipolar) reactive magnetron sputtering under variable nitrogen flow in a gas mixture of argon …

The amount of residual stress generated during the growth process of aluminum nitride
(AlN) thin films prepared by pulsed DC reactive magnetron sputtering was investigated. The …

Aluminum nitride is a promising material for structural and functional applications. Cubic AlN
(c-AlN) is expected to have higher thermal conductivity due to their high symmetry; however …

Aluminum nitride (AlN) films have been deposited on glass substrates at various nitrogen
flow ratios by rf reactive magnetron sputtering. The AlN film deposited at 10% of nitrogen …

AlN films were prepared with a microwave plasma enhanced chemical vapor deposition
reactor working at different process temperatures in order to obtain polycrystalline< 0001> …