Swift heavy ion irradiation-induced modifications in the electrical and surface properties of β-Ga2O3

N Manikanthababu, BR Tak, K Prajna, S Sarkar… - Applied Physics …, 2020 - pubs.aip.org
The electrical device characteristics of Ni/β-Ga 2 O 3 vertical Schottky barrier diodes (SBDs)
were measured in situ during the irradiation of 120 MeV Ag 7+ swift heavy ions (SHIs) …

Towards vertical Schottky diodes on bulk cubic silicon carbide (3C-SiC)

F Roccaforte, G Greco, P Fiorenza, S Di Franco… - Applied Surface …, 2022 - Elsevier
In this paper, we demonstrate the feasibility of fabricating vertical Schottky diodes on bulk
cubic silicon carbide (3C-SiC) material obtained by combining sublimation epitaxy and …

Electronic excitation-induced tunneling and charge-trapping explored by in situ electrical characterization in Ni/HfO2/β-Ga2O3 metal–oxide–semiconductor capacitors

N Manikanthababu, BR Tak, K Prajna, S Sarkar… - Materials Science and …, 2022 - Elsevier
In situ current–voltage and capacitance–voltage characteristics were performed on Ni/HfO
2/β-Ga 2 O 3 devices using 120 MeV Ag 7+ swift heavy ion (SHI) irradiation. The Poole …

An experimental study: Dependence of Schottky diode parameters on Schottky contact area size

H Efeoǧlu, A Turut, M Gül - Optical Materials, 2023 - Elsevier
We have investigated whether the Schottky barrier diodes (SBD) parameters such as the SB
height and ideality factor (IF) change as a function of Schottky contact (SC) area, in the Pt/n …

Electronic excitation induced defect dynamics in HfO2 based MOS devices investigated by in-situ electrical measurements

N Manikanthababu, S Vajandar, N Arun… - Applied Physics …, 2018 - pubs.aip.org
In-situ IV and CV characterization studies were carried out to determine the device quality of
atomic layer deposited HfO 2 (2.7 nm)/SiO 2 (0.6 nm)/Si-based metal oxide semiconductor …

In-situ transport and microstructural evolution in GaN Schottky diodes and epilayers exposed to swift heavy ion irradiation

A Kumar, R Singh, P Kumar, UB Singh… - Journal of Applied …, 2018 - pubs.aip.org
A systematic investigation of radiation hardness of Schottky barrier diodes and GaN epitaxial
layers is carried out by employing in-situ electrical resistivity and cross sectional …

Enhanced photodetection performance of self-biased γ-In2Se3/p-Si heterojunction photodetectors using argon ion irradiation

Y Hase, P Kolhe, V Doiphode, A Punde… - Journal of Materials …, 2024 - Springer
In this work, γ-In2Se3 thin films were deposited on ap-type Si (p-Si) substrate using RF
magnetron sputtering. The effects of Ar+ ion irradiation on structural, optical, morphological …

Ion Irradiation-Induced Interface Mixing and the Charge Trap Profiles Investigated by In Situ Electrical Measurements in Pt/Al2O3/ β-Ga2O3 MOSCAPs

N Manikanthababu, C Joishi, J Biswas… - … on Electron Devices, 2023 - ieeexplore.ieee.org
In situ and measurements were performed during the 120 MeV Au ion irradiation on the Pt/Al-
Ga 2 O 3, metal–oxide–semiconductor capacitors (MOSCAPs), to comprehend the swift …

Current–Voltage Characteristics of Pt Metal-based and PtSi Silicide-based n-Si Schottky Diodes over a Wide Measuring Temperature Range

H Efeoǧlu, A Turut, M Gül - Journal of Electronic Materials, 2023 - Springer
We have compared the I–V–T characteristics of the metal-based Pt/n-Si and silicide-based
PtSi/n-Si Schottky barrier (SB) diodes in the temperature range of 40–320 K. The results …

In situ IV and CV characterization of Pt/n-GaN Schottky barrier diodes irradiated by 100 MeV oxygen ions

N Kumar, F Chand, R Pandey, RK Brajpuriya… - Journal of Materials …, 2023 - Springer
Abstract Pt/n-GaN Schottky diodes were fabricated on metal organic chemical vapor
deposition grown epitaxial GaN thin films. Temperature-dependent electrical …