Dissolution characteristics of poly (methyl methacrylate) as an X-ray resist
EM Lehockey, JD Wice, I Reid - Canadian Journal of Physics, 1987 - cdnsciencepub.com
Une réversion dans les caractéristiques de dissolution du poly [méthyle
méthacrylate](PMMA) irradié aux rayons X a été montrée expérimentalement, et on a …
méthacrylate](PMMA) irradié aux rayons X a été montrée expérimentalement, et on a …
Positive Radiation Resists
WM Moreau, WM Moreau - Semiconductor Lithography: Principles …, 1988 - Springer
Positive radiation resists are required for submicrometer lithography using high-energy (10–
200 keV) X-ray, ion, and electron beams. Since the resolution of an exposure process is …
200 keV) X-ray, ion, and electron beams. Since the resolution of an exposure process is …