Photopolymers broadly comprise monomers, oligomers, polymers, or mixtures of the
aforementioned materials that upon exposure to light undergo photochemical reactions that …

Computers and other electronic devices are an integral and ubiquitous part of the modern
world. One of the key drivers for the development, power, cost, and availability of these …

In this study, a comprehensive approach towards assessing pattern collapse challenges and
solutions for Extreme Ultraviolet Lithography (EUV) resists beyond the 14nm node is …

Negative-tone molecular resists are organic small molecule resists that can be
lithographically patterned in the negative tone. This chapter examines a wide variety of …

Conventional chemically amplified resists have several issues that can potentially limit their
capability for sub-40 nm imaging. One of the major issues at this size scale is that the …

Pattern collapse has become an issue of increasing importance in semiconductor
lithography as the size of critical features continues to shrink. Although models have been …

A Monte Carlo electron scattering simulation tool that can create SEM images of 3D features
with arbitrary geometry has been developed. This is combined with both a stochastic resist …

One of the problems for lithographic processes at very small feature scales is pattern
collapse caused by unbalanced capillary forces experienced by the photoresist patterns …