Scatterometry is a fast, precise and low cost way to determine the mean pitch and
dimensional parameters of periodic structures with lateral resolution of a few nanometer. It is …

The demand for nanomanufacturing is driven by the current trend of decreasing product
sizes and the energy consumed by large modules, which will be surpassed by the creation …

Defect inspection on lithographic substrates, masks, reticles, and wafers is an important
quality assurance process in semiconductor manufacturing. Coherent Fourier scatterometry …

The transition matrix, frequently abbreviated as T-matrix, contains the complete information
in a linear approximation of how a spatially localized object scatters an incident field. The T …

Background: Scatterometry is a fast, indirect, and nondestructive optical method for quality
control in the production of lithography masks. To solve the inverse problem in compliance …

Scatterometry is a fast, indirect and nondestructive optical method for the quality control in
the production of lithography masks. Geometry parameters of line gratings are obtained from …

The dark-field microscopy method with alternating grazing incidence UV illumination (UV-
AGID) developed at Physikalisch-Technische Bundesanstalt offers the possibility of …

Diese Dissertation beschäftigt sich mit der Kombination aus verlässlicher Fehlerkontrolle
und datenbasierter Approximation um nicht-intrusive und zuverlässige Algorithmen zur …

Optical metrology of grating parameters with small scattering volumes, such as side wall
angles (SWAs), is an indispensable prerequisite for accurate process control in modern …

Scatterometry is a fast, indirect and nondestructive optical method for the quality control in
the production of lithography masks. Geometry parameters of line gratings are obtained from …