Transistors based on two-dimensional materials for future integrated circuits
Field-effect transistors based on two-dimensional (2D) materials have the potential to be
used in very large-scale integration (VLSI) technology, but whether they can be used at the …
used in very large-scale integration (VLSI) technology, but whether they can be used at the …
Hexagonal boron nitride for next‐generation photonics and electronics
S Moon, J Kim, J Park, S Im, J Kim, I Hwang… - Advanced …, 2023 - Wiley Online Library
Hexagonal boron nitride (h‐BN), an insulating 2D layered material, has recently attracted
tremendous interest motivated by the extraordinary properties it shows across the fields of …
tremendous interest motivated by the extraordinary properties it shows across the fields of …
Vapour-phase deposition of two-dimensional layered chalcogenides
Abstract Two-dimensional (2D) layered materials are attracting a lot of attention because of
unique physicochemical properties that are intriguing for both fundamental research and …
unique physicochemical properties that are intriguing for both fundamental research and …
Plasma processing and treatment of 2D transition metal dichalcogenides: tuning properties and defect engineering
Two-dimensional transition metal dichalcogenides (TMDs) offer fascinating opportunities for
fundamental nanoscale science and various technological applications. They are a …
fundamental nanoscale science and various technological applications. They are a …
Materials for interconnects
The electrical resistance of interconnect wires increases with decreasing size, causing
signal delay and energy consumption that limits further downscaling of integrated circuits …
signal delay and energy consumption that limits further downscaling of integrated circuits …
[HTML][HTML] Opportunities and challenges of 2D materials in back-end-of-line interconnect scaling
As the challenges in continued scaling of the integrated circuit technology escalate every
generation, there is an urgent need to find viable solutions for both the front-end-of-line …
generation, there is an urgent need to find viable solutions for both the front-end-of-line …
Scalable Substitutional Re‐Doping and its Impact on the Optical and Electronic Properties of Tungsten Diselenide
Reliable, controlled doping of 2D transition metal dichalcogenides will enable the realization
of next‐generation electronic, logic‐memory, and magnetic devices based on these …
of next‐generation electronic, logic‐memory, and magnetic devices based on these …
Materials quest for advanced interconnect metallization in integrated circuits
Integrated circuits (ICs) are challenged to deliver historically anticipated performance
improvements while increasing the cost and complexity of the technology with each …
improvements while increasing the cost and complexity of the technology with each …
MoS2 as an Effective Cu Diffusion Barrier with a Back-End Compatible Process
CY Kuo, YT Chang, YT Huang, IC Ni… - … Applied Materials & …, 2023 - ACS Publications
This study demonstrates molybdenum disulfide (MoS2) as a superior candidate as a
diffusion barrier and liner. This research explores a newly developed process to show how …
diffusion barrier and liner. This research explores a newly developed process to show how …
Evaluating size effects on the thermal conductivity and electron-phonon scattering rates of copper thin films for experimental validation of Matthiessen's rule
As metallic nanostructures shrink towards the size of the electronic mean free path, thermal
conductivity decreases due to increased electronic scattering rates. Matthiessen's rule is …
conductivity decreases due to increased electronic scattering rates. Matthiessen's rule is …