An overview of spatial microscopic and accelerated kinetic Monte Carlo methods
A Chatterjee, DG Vlachos - Journal of computer-aided materials design, 2007 - Springer
The microscopic spatial kinetic Monte Carlo (KMC) method has been employed extensively
in materials modeling. In this review paper, we focus on different traditional and multiscale …
in materials modeling. In this review paper, we focus on different traditional and multiscale …
Reshaping, intermixing, and coarsening for metallic nanocrystals: Nonequilibrium statistical mechanical and coarse-grained modeling
Self-assembly of supported 2D or 3D nanocrystals (NCs) by vacuum deposition and of 3D
NCs by solution-phase synthesis (with possible subsequent transfer to a support) produces …
NCs by solution-phase synthesis (with possible subsequent transfer to a support) produces …
Microstructural evolution during film growth
Atomic-scale control and manipulation of the microstructure of polycrystalline thin films
during kinetically limited low-temperature deposition, crucial for a broad range of industrial …
during kinetically limited low-temperature deposition, crucial for a broad range of industrial …
Optical, electronic, and transport properties of nanocrystalline titanium nitride thin films
P Patsalas, S Logothetidis - Journal of Applied Physics, 2001 - pubs.aip.org
Spectroscopic ellipsometry (SE) was employed to get insights on the optical, electronic, and
transport properties of nanocrystalline titanium nitride (TiN x) films with respect to their …
transport properties of nanocrystalline titanium nitride (TiN x) films with respect to their …
Mapping structure heterogeneities and visualizing moisture degradation of perovskite films with nano-focus WAXS
Extensive attention has focused on the structure optimization of perovskites, whereas rare
research has mapped the structure heterogeneity within mixed hybrid perovskite films …
research has mapped the structure heterogeneity within mixed hybrid perovskite films …
An improved fuzzy MULTIMOORA approach for multi-criteria decision making based on objective weighting method (CCSD) and its application to technological …
Abstract MULTIMOORA (Multi-Objective Optimization on the basis of Ratio Analysis plus full
multiplicative form) is a somewhat new multi criteria decision-making (MCDM) method which …
multiplicative form) is a somewhat new multi criteria decision-making (MCDM) method which …
Thin film nucleation, growth, and microstructural evolution: an atomic scale view
JE Greene - Handbook of deposition technologies for films and …, 2010 - Elsevier
Publisher Summary Atomic scale understanding of microstructural evolution, necessary for
the controlled manipulation of the properties of thin film systems, is increasing rapidly. The …
the controlled manipulation of the properties of thin film systems, is increasing rapidly. The …
Comprehensive perspective on the mechanism of preferred orientation in reactive-sputter-deposited nitrides
Y Kajikawa, S Noda, H Komiyama - Journal of Vacuum Science & …, 2003 - pubs.aip.org
Texture control of sputter-deposited nitride films has provoked a great deal of interest due to
its technological importance. Despite extensive research, however, the reported results are …
its technological importance. Despite extensive research, however, the reported results are …
Theory and molecular simulations of plasma sputtering, transport and deposition processes
P Brault, AL Thomann, M Cavarroc - The European Physical Journal D, 2023 - Springer
The present review provides an overview of the basic theory of sputtering with recent
models, focusing in particular on sputtered atom energy distribution functions. Molecular …
models, focusing in particular on sputtered atom energy distribution functions. Molecular …
On the physical and chemical details of alumina atomic layer deposition: A combined experimental and numerical approach
Alumina thin film is typically studied as a model atomic layer deposition (ALD) process due
to its high dielectric constant, high thermal stability, and good adhesion on various wafer …
to its high dielectric constant, high thermal stability, and good adhesion on various wafer …