Atomic layer deposition (ALD) is a vapor phase technique capable of producing thin films of
a variety of materials. Based on sequential, self-limiting reactions, ALD offers exceptional …

Atomic layer deposition (ALD) is a thin film technology that in the past two decades rapidly
developed from a niche technology to an established method. It proved to be a key …

A method for using atomic layer deposition to produce a film configured for use in an anode,
cathode, or solid state electrolyte of a lithium-ion battery or a lithium-sulfur battery. The …

Atomic layer deposition (ALD) is a gas-phase deposition technique that, by relying on self-
terminating surface chemistry, enables the control of the amount of deposited material down …

DOI: 10.1002/adma. 201403965 technology, now adopted in the electronics industry in
semiconductor manufacturing. Furthermore, ALD has demonstrated viability in high …

The photocathodic hydrogen evolution reaction (HER) from p-type Si nanowire (NW) arrays
was evaluated using platinum deposited by atomic layer deposition (ALD) as a HER …

Conspectus The field of nanoscience is delivering increasingly intricate yet elegant
geometric structures incorporating an ever-expanding palette of materials. Atomic layer …

Quantum dot nanoscale semiconductor heterostructures (QDHs) are a class of materials
potentially useful for integration into solar energy conversion devices. However, realizing the …

Development at the nanoscale has established diverse and complex structures with the help
of a growing selection of materials to choose from. Among the major developments that has …

Investment into photovoltaic (PV) research has accelerated over the past decade as
concerns over energy security and carbon emissions have increased. The types of PV …