The absolute densities of H atoms produced in catalytic chemical vapor deposition (Cat-
CVD or hot-wire CVD) processes were determined by employing two-photon laser-induced …

Microcrystalline silicon (⁠ μ c-Si: H) of superior quality can be prepared using the hot-wire
chemical-vapor deposition method (HWCVD). At a low substrate temperature (TS) of 185 C …

Radical species, including atomic hydrogen, play an important role in the CVD process to
prepare high‐quality thin solid films. Detailed information on the absolute densities of these …

The consequences of implementing a Hot Wire Chemical Vapor Deposition (HWCVD)
chamber into an existing in-line or roll-to-roll reactor are described. The hardware and …

Major recent advances: A variety of in situ diagnostic techniques have been applied recently
to detect reactive species, including H, Si, SiH, SiH2, SiH3 and Si2H6, in hot wire chemical …

A review of the hot wire chemical vapor deposition (HWCVD) of Si-containing materials for
solar cell applications is given. A short history of the technique is given, starting from the …

We demonstrate low-loss hydrogenated amorphous silicon (a-Si: H) waveguides by hot-wire
chemical vapor deposition (HWCVD). The effect of hydrogenation in a-Si at different …

Preparation of SiC (0001) substrates is of high relevance to graphene growth. Yet, if only a
smooth surface could be achieved, heteroepitaxy of many other two-dimensional materials …

Instead of photoresist removal methods using chemicals, we investigated an
environmentally friendly removal method using atomic hydrogen generated by decomposing …

The epitaxial growth of silicon (Si) films during the catalytic chemical vapor deposition (Cat-
CVD) of intrinsic amorphous Si (ia-Si) passivation films on crystalline Si (c-Si) wafers is …