Survey on iterative learning control, repetitive control, and run-to-run control
In this paper, three control methods—iterative learning control (ILC), repetitive control (RC),
and run-to-run control (R2R)—are studied and compared. Some mathematical …
and run-to-run control (R2R)—are studied and compared. Some mathematical …
Run-to-run process control: Literature review and extensions
E Del Castillo, AM Hurwitz - Journal of Quality Technology, 1997 - Taylor & Francis
In the last few years,“Run-to-Run”(R2R) control techniques have been developed and used
to control various semiconductor manufacturing processes. These techniques combine …
to control various semiconductor manufacturing processes. These techniques combine …
[图书][B] The CRC handbook of mechanical engineering
DY Goswami - 2004 - taylorfrancis.com
Since the first edition of this comprehensive handbook was published ten years ago, many
changes have taken place in engineering and related technologies. Now, this best-selling …
changes have taken place in engineering and related technologies. Now, this best-selling …
Run by run process control: Combining SPC and feedback control
E Sachs, A Hu, A Ingolfsson - IEEE Transactions on …, 1995 - ieeexplore.ieee.org
The run by run controller provides a framework for controlling a process which is subject to
disturbances such as shifts and drifts as a normal part of its operation. The run by run …
disturbances such as shifts and drifts as a normal part of its operation. The run by run …
Automatic control in microelectronics manufacturing: Practices, challenges, and possibilities
TF Edgar, SW Butler, WJ Campbell, C Pfeiffer, C Bode… - Automatica, 2000 - Elsevier
Advances in modeling and control will be required to meet future technical challenges in
microelectronics manufacturing. The implementation of closed-loop control on key unit …
microelectronics manufacturing. The implementation of closed-loop control on key unit …
Stability and sensitivity of an EWMA controller
A Ingolfsson, E Sachs - Journal of Quality Technology, 1993 - Taylor & Francis
The performance of a process control algorithm based on the EWMA statistic is analyzed. A
simple condition relating the EWMA weight and the estimated process gain is shown to …
simple condition relating the EWMA weight and the estimated process gain is shown to …
A survey of run-to-run control for batch processes
Abstract Run-to-run (R2R) control is widely used in semiconductor manufacturing systems to
minimize the process drift, shift and variability. The R2R controller adjusts control actions or …
minimize the process drift, shift and variability. The R2R controller adjusts control actions or …
Method, system and medium for process control for the matching of tools, chambers and/or other semiconductor-related entities
AP Shanmugasundram, H Armer… - US Patent 7,082,345, 2006 - Google Patents
The invention relates to a method, system and computer program useful for producing a
product, such as a microelectronic device, for example in an assembly line, where the …
product, such as a microelectronic device, for example in an assembly line, where the …
Statistical process control in semiconductor manufacturing
CJ Spanos - Proceedings of the IEEE, 1992 - ieeexplore.ieee.org
The author presents a brief survey of standard SPC (statistical process control) schemes,
and illustrates them through examples taken from the semiconductor industry. These …
and illustrates them through examples taken from the semiconductor industry. These …
Data‐driven terminal iterative learning control with high‐order learning law for a class of non‐linear discrete‐time multiple‐input–multiple output systems
In this study, a novel data‐driven terminal iterative learning control with high‐order learning
law is proposed for a class of non‐linear non‐affine discrete‐time multiple‐input–multiple …
law is proposed for a class of non‐linear non‐affine discrete‐time multiple‐input–multiple …