57 ABSTRACT A vertically oriented thermal processor Supporting Semicon ductor wafers
within a vertical processing chamber within a proceSS tube about which a furnace heater is …

Controllers and associated methods for controlling a thermal reactor or other thermal
semiconductor processors which include a heating element powered by a power source …

ABSTRACT A mathematical model has been developed to predict wafer temperatures within
a hot-wall multiwafer low pressure chemical vapor deposition (LPCVD) reactor. The model …

A general fundamental model for low pressure chemical vapor deposition in a multiwafer
reactor has been developed and evaluated in terms of its ability to predict polycrystalline …

Simulation strategies for chemical vapor deposition (CVD) of thin solid films are presented,
with emphasis on direct simulation Monte Carlo methods for analyzing and predicting …

The deposition of thin films in a hot‐wall multiwafer low‐pressure chemical vapor deposition
(LPCVD) reactor is an important unit operation in the manufacture of modern integrated …

Sapphire wafers can experience temperature variations during processing in a furnace,
which in turn can cause large deformation and stresses in the wafers. This paper aims to …

ABSTRACT A direct simulation Monte Carlo technique is used to simulate the radiation heat
transfer in a multiwafer low pressure chemical vapor deposition (LPCVD) reactor. The model …

This review surveys and characterizes papers comprising various fields of heat transfer that
were published in the literature during 1993. It is intended to encompass the English …

Wafer temperature distribution and gas flow inside a tube of a chemical vapor deposition
chamber, which is a semiconductor fabrication equipment, were analyzed. The control …