Carbon nanotube growth by PECVD: a review

M Meyyappan, L Delzeit, A Cassell… - Plasma sources science …, 2003 - iopscience.iop.org
Carbon nanotubes (CNTs), due to their unique electronic and extraordinary mechanical
properties, have been receiving much attention for a wide variety of applications. Recently …

Free-radical-induced grafting from plasma polymer surfaces

F Khelifa, S Ershov, Y Habibi, R Snyders… - Chemical …, 2016 - ACS Publications
With the advances in science and engineering in the second part of the 20th century,
emerging plasma-based technologies continuously find increasing applications in the …

[HTML][HTML] Review of inductively coupled plasmas: Nano-applications and bistable hysteresis physics

HC Lee - Applied Physics Reviews, 2018 - pubs.aip.org
Many different gas discharges and plasmas exhibit bistable states under a given set of
conditions, and the history-dependent hysteresis that is manifested by intensive quantities of …

Nonthermal plasma synthesis of semiconductor nanocrystals

U Kortshagen - Journal of Physics D: Applied Physics, 2009 - iopscience.iop.org
Semiconductor nanocrystals have attracted considerable interest for a wide range of
applications including light-emitting devices and displays, photovoltaic cells, nanoelectronic …

Determination of the vibrational, rotational and electron temperatures in N2 and Ar–N2 rf discharge

N Britun, M Gaillard, A Ricard, YM Kim… - Journal of Physics D …, 2007 - iopscience.iop.org
In order to characterize a nonequilibrium molecular plasma from the point of view of
translational, vibrational and rotational degrees of freedom and their interaction, the …

Modeling of particulate coagulation in low pressure plasmas

U Kortshagen, U Bhandarkar - Physical Review E, 1999 - APS
In this paper we study the growth of nanometer particles in low pressure plasmas due to
coagulation. We describe results of a model which involves the self-consistent determination …

Hysteresis and the E-to-H transition in radiofrequency inductive discharges

MM Turner, MA Lieberman - Plasma Sources Science and …, 1999 - iopscience.iop.org
Typical inductive discharges, such as are used for plasma processing, exhibit two modes of
operation: the true inductive discharge known as the H mode, and a weak capacitive …

Enhancement of Ohmic and Stochastic Heating by Resonance Effects<? format?> in Capacitive Radio Frequency Discharges: A Theoretical Approach

T Mussenbrock, RP Brinkmann, MA Lieberman… - Physical review …, 2008 - APS
In low-pressure capacitive radio frequency discharges, two mechanisms of electron heating
are domi<? format?> nant:(i) Ohmic heating due to collisions of electrons with neutrals of the …

[HTML][HTML] The role of plasma in plasma-enhanced atomic layer deposition of crystalline films

DR Boris, VD Wheeler, N Nepal, SB Qadri… - Journal of Vacuum …, 2020 - pubs.aip.org
The inclusion of plasma in atomic layer deposition processes generally offers the benefit of
substantially reduced growth temperatures and greater flexibility in tailoring the gas-phase …

Non-Thermal Plasma as Environmentally-Friendly Technology for Agriculture: A Review and Roadmap

F Bilea, M Garcia-Vaquero, M Magureanu… - Critical Reviews in …, 2024 - Taylor & Francis
New approaches are required in the agricultural sector to keep pace with the ever-growing
demand for food in the context of climate change and resource deterioration and avoiding …