The need for increased control of layer thickness and uniformity as device dimensions shrink
has spurred increased use of atomic layer deposition (ALD) for thin film growth. The ability to …

Hydrogenated amorphous dielectric thin films are critical materials in a wide array of
technologies. In this work, we present a thorough investigation of the thermal conductivity of …

Atomic layer deposited (ALD) high-dielectric-constant (high-k) materials have found
extensive applications in a variety of electronic, optical, optoelectronic, and photovoltaic …

The role of interfacial nonidealities and disorder on thermal transport across interfaces is
traditionally assumed to add resistance to heat transfer, decreasing the thermal boundary …

Precise characterization of the mechanical properties of ultrathin films is of paramount
importance for both a fundamental understanding of nanoscale materials and for continued …

Amorphous solids are traditionally assumed to set the lower bound to the vibrational thermal
conductivity of a material due to the high degree of structural disorder. Here, were …

The microstructure and mechanical properties of amorphous silicon oxycarbide (SiOC)
before and after irradiation were investigated using Fourier-transform infrared spectroscopy …

Ultrathin films and multilayers, with controlled thickness down to single atomic layers, are
critical for advanced technologies ranging from nanoelectronics to spintronics to quantum …

Silicon carbide coatings and thin films are used for a wide array of applications ranging from
thermal barrier coatings to microelectronics. In this paper, we report on the role of mass …

We demonstrate a method to reduce the thermal conductivity of fully dense (above the
rigidity percolation threshold) amorphous thin films below the minimum limit by …