Laser Annealing of Semiconductors deals with the materials science of surfaces that have
been subjected to ultrafast heating by intense laser or electron beams. This book is …

The annealing of semiconductors is of critical importance for successful electronic device
fabrication. The present review surveys the new field of transient annealing and covers all …

Short time annealing has recently become of interest in silicon processing as a technique to
activate ion implanted dopants, remove defects, and regrow amorphized silicon, with …

Rapid annealing (RA), an eco-friendly, soft processing technique was employed to
manipulate emission properties of nanocrystalline ZnGa 1.99 Eu 0.01 O 4. With RA …

Lasers have long established a permanent position in manufacturing. 1–5 They are used to
cut hard and brittle materials, to weld metallic objects rapidly and efficiently, to harden locally …

The authors give a broad overview of some of the possible (and actual) applications of rapid
thermal processing (RTP) techniques. Pioneering work done in the field of RTP is described …

Transient annealing with a graphite strip heater has been used to accomplish solid‐phase
epitaxial recrystallization of amorphous layers produced in Si by implantation of 120‐keV …

Low dose implants of Si+ into semi-insulating GaAs have been annealed with the multiply
scanned electron beam processing system. The activation of ions was about 55%, with a …

Beam power per unit area and exposure time are the predominant factors in defining implant
anneal conditions for the multiple scan electron beam annealing technique. A theoretical …

An isothermal processing system using a 2-kW electron beam is described. Processing of
areas up to 4 X 4 in. is achieved by rapidly scanning the beam in the multiple scan mode. An …