Relationship between poly (4-hydroxystyrene)(PHS) and tetramethylammonium hydroxide (TMAH) concentrations during the development of PHS films in TMAH …
YT Ito, K Watanabe, Y Jin, T Kozawa… - Japanese Journal of …, 2024 - iopscience.iop.org
Abstract Development (the dissolution of resist films in developer) is an important
lithographic process. However, details of the dissolution of resist polymers remain …
lithographic process. However, details of the dissolution of resist polymers remain …
Lithography in a quantum world
HJ Levinson - Japanese Journal of Applied Physics, 2023 - iopscience.iop.org
The conceptualization of the lithography process as captured in models was long based
primarily on classical physics. It is now essential to model the lithography process at the …
primarily on classical physics. It is now essential to model the lithography process at the …