ZnO as a functional material, a review

MA Borysiewicz - Crystals, 2019 - mdpi.com
Zinc oxide (ZnO) is a fascinating wide band gap semiconductor material with many
properties that make it widely studied in the material science, physics, chemistry …

Atomic layer deposition: an enabling technology for the growth of functional nanoscale semiconductors

N Biyikli, A Haider - Semiconductor Science and Technology, 2017 - iopscience.iop.org
In this paper, we present the progress in the growth of nanoscale semiconductors grown via
atomic layer deposition (ALD). After the adoption by semiconductor chip industry, ALD …

Influence of film thickness and annealing temperature on the structural and optical properties of ZnO thin films on Si (1 0 0) substrates grown by atomic layer …

JL Tian, HY Zhang, GG Wang, XZ Wang, R Sun… - Superlattices and …, 2015 - Elsevier
In this paper, ZnO thin films with different thicknesses grown on Si (1 0 0) substrates by
atomic layer deposition (ALD) method were annealed in nitrogen at the temperatures …

Vacancy cluster in ZnO films grown by pulsed laser deposition

Z Wang, C Luo, W Anwand, A Wagner, M Butterling… - Scientific reports, 2019 - nature.com
Abstract Undoped and Ga-doped ZnO films were grown on c-sapphire using pulsed laser
deposition (PLD) at the substrate temperature of 600° C. Positron annihilation spectroscopy …

[HTML][HTML] Atomic layer deposition of environmentally benign SnTiOx as a potential ferroelectric material

S Chang, SK Selvaraj, YY Choi, S Hong… - Journal of Vacuum …, 2016 - pubs.aip.org
Inspired by the need to discover environmentally friendly, lead-free ferroelectric materials,
here the authors report the atomic layer deposition of tin titanate (SnTiO x) aiming to obtain …

Atomic Layer Deposition of ZnO for Modulation of Electrical Properties in n-GaN Schottky Contacts

H Kim, MJ Jung, S Choi, BJ Choi - Journal of Electronic Materials, 2021 - Springer
ZnO films (5 nm and 20 nm) have been grown on GaN single-crystal substrates by thermal
atomic layer deposition (ALD) and the electrical properties of n-GaN Schottky contacts …

[HTML][HTML] Defectivity of Al: ZnO thin films with different crystalline order probed by Positron Annihilation Spectroscopy

RM Maffei, M Butterling, MO Liedke, S D'Addato… - Applied Surface …, 2024 - Elsevier
Abstract Three Positron Annihilation Spectroscopy (PAS) techniques have been employed
to investigate the point defects of Al-doped Zinc Oxide (AZO) thin films grown by Radio …

Structure–property relationship and interfacial phenomena in GaN grown on C-plane sapphire via plasma-enhanced atomic layer deposition

P Motamedi, K Cadien - RSC advances, 2015 - pubs.rsc.org
Gallium nitride films were deposited via plasma-enhanced atomic layer deposition (PEALD)
using triethylgallium and forming gas as precursors. An optimized process was developed …

Current transport properties of Pt/n-GaN Schottky diodes with ZnO interlayers

H Kim, MJ Jung, BJ Choi - Solid State Communications, 2022 - Elsevier
In this work, atomic layer deposition (ALD) was used to grow 20-nm thick ZnO interlayers (IL)
on a GaN substrate at 150 and 200° C and the current transport mechanisms of vertical …

Influence of the lattice mismatch on the atomic ordering of ZnO grown by atomic layer deposition onto single crystal surfaces with variable mismatch (InP, GaAs, GaN …

J Faugier-Tovar, F Lazar, C Marichy, C Brylinski - Condensed Matter, 2017 - mdpi.com
It has previously been reported that epitaxial growth of ZnO can be obtained at low
temperatures by atomic layer deposition (ALD) onto a GaN (0001-Ga) surface …