Recent advances in sequential infiltration synthesis (Sis) of block copolymers (bcps)

E Cara, I Murataj, G Milano, N De Leo, L Boarino… - Nanomaterials, 2021 - mdpi.com
In the continuous downscaling of device features, the microelectronics industry is facing the
intrinsic limits of conventional lithographic techniques. The development of new synthetic …

Poly (vinylpyridine) segments in block copolymers: Synthesis, self-assembly, and versatility

JG Kennemur - Macromolecules, 2019 - ACS Publications
This Perspective provides a current survey on the synthesis, self-assembly, and vast variety
of applications possible from block copolymer (BCP) systems containing at least one …

Using block copolymers as infiltration sites for development of future nanoelectronic devices: Achievements, barriers, and opportunities

C Cummins, MA Morris - Microelectronic Engineering, 2018 - Elsevier
Creating inorganic nanostructures for development of nanoelectronic device components is
a highly active research area. The ability for manipulation of the chemistry of materials, as …

The chemical physics of sequential infiltration synthesis—A thermodynamic and kinetic perspective

RZ Waldman, DJ Mandia, A Yanguas-Gil… - The Journal of …, 2019 - pubs.aip.org
Sequential infiltration synthesis (SIS) is an emerging materials growth method by which
inorganic metal oxides are nucleated and grown within the free volume of polymers in …

Preserving nanoscale features in polymers during laser induced graphene formation using sequential infiltration synthesis

DS Bergsman, BA Getachew, CB Cooper… - Nature …, 2020 - nature.com
Direct lasing of polymeric membranes to form laser induced graphene (LIG) offers a scalable
and potentially cheaper alternative for the fabrication of electrically conductive membranes …

Directed self-assembly of block copolymers for sub-10 nm fabrication

Y Chen, S Xiong - International Journal of Extreme Manufacturing, 2020 - iopscience.iop.org
Directed self-assembly (DSA) emerges as one of the most promising new patterning
techniques for single digit miniaturization and next generation lithography. DSA achieves …

Sequential infiltration synthesis of electronic materials: group 13 oxides via metal alkyl precursors

RZ Waldman, N Jeon, DJ Mandia… - Chemistry of …, 2019 - ACS Publications
The sequential infiltration synthesis (SIS) of group 13 indium and gallium oxides (In2O3 and
Ga2O3) into poly (methyl methacrylate)(PMMA) thin films is demonstrated using …

Reaction–diffusion transport model to predict precursor uptake and spatial distribution in vapor-phase infiltration processes

Y Ren, EK McGuinness, C Huang… - Chemistry of …, 2021 - ACS Publications
Vapor-phase infiltration (VPI) has emerged as a scalable process for transforming polymer
products into a variety of organic–inorganic hybrid materials with potential applications to a …

The development and atomic structure of zinc oxide crystals grown within polymers from vapor phase precursors

I Weisbord, M Barzilay, R Cai, E Welter, A Kuzmin… - ACS …, 2024 - ACS Publications
Sequential infiltration synthesis (SIS), also known as vapor phase infiltration (VPI), is a
quickly expanding technique that allows growth of inorganic materials within polymers from …

Infiltration synthesis of diverse metal oxide nanostructures from epoxidized diene–styrene block copolymer templates

DH Yi, CY Nam, G Doerk, CT Black… - ACS Applied Polymer …, 2019 - ACS Publications
Infiltration synthesis is a class of block copolymer lithography in which block copolymer
templates are selectively infiltrated with metal or metal oxide precursors, which has been …