Micromanufacturing: a review—part I
Micromanufacturing processes are expanding in their length and breadth as long as the
related research and development (R&D) activities and applications are concerned …
related research and development (R&D) activities and applications are concerned …
Moving mask UV lithography for three-dimensional structuring
This paper presents a systematic study on a novel 3D (three-dimensional) UV (ultraviolet)
lithography apparatus for thick photoresist and a UV lithography process simulation for 3D …
lithography apparatus for thick photoresist and a UV lithography process simulation for 3D …
Fabrication of a sub-10 nm silicon nanowire based ethanol sensor using block copolymer lithography
This paper details the fabrication of ultrathin silicon nanowires (SiNWs) on a silicon-on-
insulator (SOI) substrate as an electrode for the electro-oxidation and sensing of ethanol …
insulator (SOI) substrate as an electrode for the electro-oxidation and sensing of ethanol …
Orientation and Alignment Control of Microphase-Separated PS-b-PDMS Substrate Patterns via Polymer Brush Chemistry
Block copolymer (BCP) microphase separation at substrate surfaces might enable the
generation of substrate features in a scalable, bottom-up fashion, provided that the pattern …
generation of substrate features in a scalable, bottom-up fashion, provided that the pattern …
Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by …
The self-assembly of a lamellar-forming polystyrene-block-poly (dimethylsiloxane)(PS-b-
PDMS) diblock copolymer (DBCP) was studied herein for surface nanopatterning. The …
PDMS) diblock copolymer (DBCP) was studied herein for surface nanopatterning. The …
Pulsed transfer etching of PS–PDMS block copolymers self-assembled in 193 nm lithography stacks
C Girardot, S Böhme, S Archambault… - … applied materials & …, 2014 - ACS Publications
This work presents the graphoepitaxy of high-χ block copolymers (BCP) in standard industry-
like lithography stacks and their transfer into the silicon substrate The process includes …
like lithography stacks and their transfer into the silicon substrate The process includes …
Soft Graphoepitaxy for Large Area Directed Self‐Assembly of Polystyrene‐block‐Poly(dimethylsiloxane) Block Copolymer on Nanopatterned POSS Substrates …
Polyhedral oligomeric silsequioxane (POSS) derivatives have been successfully employed
as substrates for graphoepitaxial directed self‐assembly (DSA) of block copolymers (BCPs) …
as substrates for graphoepitaxial directed self‐assembly (DSA) of block copolymers (BCPs) …
A three-dimensional microstructuring technique exploiting the positive photoresist property
The present paper describes a three-dimensional (3D) thick-photoresist microstructuring
technique that exploits the effect of exposure wavelength on dissolution rate distributions in …
technique that exploits the effect of exposure wavelength on dissolution rate distributions in …
Tuning PDMS Brush Chemistry by UV–O3 Exposure for PS-b-PDMS Microphase Separation and Directed Self-assembly
The directed self-assembly (DSA) of block copolymer (BCP) thin films could enable a
scalable, bottom-up alternative to photolithography for the generation of substrate features …
scalable, bottom-up alternative to photolithography for the generation of substrate features …
Soft-graphoepitaxy using nanoimprinted polyhedral oligomeric silsesquioxane substrates for the directed self-assembly of PS-b-PDMS
We report here the fabrication of periodic sub-25 nm diameter size cylinder structures using
block copolymer (BCP) directed self-assembly on nanoimprinted topographically patterned …
block copolymer (BCP) directed self-assembly on nanoimprinted topographically patterned …