The future of memristors: Materials engineering and neural networks

K Sun, J Chen, X Yan - Advanced Functional Materials, 2021 - Wiley Online Library
Abstract From Deep Blue to AlphaGo, artificial intelligence and machine learning are
booming, and neural networks have become the hot research direction. However, due to the …

High-k Gate Dielectrics for Emerging Flexible and Stretchable Electronics

B Wang, W Huang, L Chi, M Al-Hashimi… - Chemical …, 2018 - ACS Publications
Recent advances in flexible and stretchable electronics (FSE), a technology diverging from
the conventional rigid silicon technology, have stimulated fundamental scientific and …

Status and prospects of ZnO-based resistive switching memory devices

FM Simanjuntak, D Panda, KH Wei… - Nanoscale research letters, 2016 - Springer
In the advancement of the semiconductor device technology, ZnO could be a prospective
alternative than the other metal oxides for its versatility and huge applications in different …

Antiferroelectricity in thin-film from first principles

SE Reyes-Lillo, KF Garrity, KM Rabe - Physical Review B, 2014 - APS
Density-functional calculations are performed to investigate the experimentally reported field-
induced phase transition in thin-film ZrO 2 [J. Müller, Nano Lett. 12, 4318 (2012) NALEFD …

A noticeable effect of Pr doping on key optoelectrical properties of CdS thin films prepared using spray pyrolysis technique for high-performance photodetector …

M Shkir, IM Ashraf, S AlFaify, AM El-Toni, M Ahmed… - Ceramics …, 2020 - Elsevier
High-quality thin film-based photodetectors containing praseodymium doped cadmium
sulfide (Pr: CdS) were fabricated through spray pyrolysis and studied for various opto …

High-k 2D Sb2O3 Made Using a Substrate-Independent and Low-Temperature Liquid-Metal-Based Process

KA Messalea, N Syed, A Zavabeti, M Mohiuddin… - ACS …, 2021 - ACS Publications
High dielectric constant (high-k) ultrathin films are required as insulating gate materials. The
well-known high-k dielectrics, including HfO2, ZrO2, and SrTiO3, feature three-dimensional …

One-dimensional ZnO nanostructures: fabrication, optoelectronic properties, and device applications

D Panda, TY Tseng - Journal of Materials Science, 2013 - Springer
Abstract One-dimensional (1D) zinc oxide (ZnO) nanostructures have been extensively and
intensively studied for several decades not only for their extraordinary chemical and physical …

Emerging applications for high K materials in VLSI technology

RD Clark - Materials, 2014 - mdpi.com
The current status of High K dielectrics in Very Large Scale Integrated circuit (VLSI)
manufacturing for leading edge Dynamic Random Access Memory (DRAM) and …

A collective study on modeling and simulation of resistive random access memory

D Panda, PP Sahu, TY Tseng - Nanoscale research letters, 2018 - Springer
In this work, we provide a comprehensive discussion on the various models proposed for the
design and description of resistive random access memory (RRAM), being a nascent …

Endurance and Cycle-to-cycle Uniformity Improvement in Tri-Layered CeO2/Ti/CeO2 Resistive Switching Devices by Changing Top Electrode Material

AM Rana, T Akbar, M Ismail, E Ahmad, F Hussain… - Scientific reports, 2017 - nature.com
Resistance switching characteristics of CeO2/Ti/CeO2 tri-layered films sandwiched between
Pt bottom electrode and two different top electrodes (Ti and TaN) with different work …