Oxide semiconductor thin‐film transistors: a review of recent advances

E Fortunato, P Barquinha, R Martins - Advanced materials, 2012 - Wiley Online Library
Transparent electronics is today one of the most advanced topics for a wide range of device
applications. The key components are wide bandgap semiconductors, where oxides of …

Effect of high-pressure oxygen annealing on negative bias illumination stress-induced instability of InGaZnO thin film transistors

KH Ji, JI Kim, HY Jung, SY Park, R Choi… - Applied Physics …, 2011 - pubs.aip.org
Negative-bias illumination stress (NBIS) of amorphous InGaZnO (IGZO) transistors can
cause a large negative shift (> 7.1 V) in threshold voltage, something frequently attributed to …

Insights into the structure of the stable and metastable compounds

JLF Da Silva, A Walsh, H Lee - Physical Review B—Condensed Matter and …, 2008 - APS
Using first-principles calculations, we identify the mechanisms that lead to the lowest energy
structures for the stable and metastable (GeTe) m (Sb 2 Te 3) n (GST) compounds, namely …

Amorphous In–Ga–Zn–O coplanar homojunction thin-film transistor

A Sato, K Abe, R Hayashi, H Kumomi… - Applied Physics …, 2009 - pubs.aip.org
A fabrication process of coplanar homojunction thin-film transistors (TFTs) is proposed for
amorphous In–Ga–Zn–O (⁠ a-IGZO), which employs highly doped contact regions naturally …

Effect of channel thickness on performance of ultra-thin body IGZO field-effect transistors

MJ Kim, HJ Park, S Yoo, MH Cho… - IEEE Transactions on …, 2022 - ieeexplore.ieee.org
Amorphous indium–gallium–zinc oxide (a-IGZO) is a promising channel material for an
upper transistor in monolithic three-dimensional devices. Although the field-effect transistors …

Remarkably stable high mobility self-aligned oxide TFT by investigating the effect of oxygen plasma time during PEALD of SiO2 gate insulator

SI Cho, JB Ko, SH Lee, J Kim, SHK Park - Journal of Alloys and …, 2022 - Elsevier
Oxide thin-film transistors (TFTs) should be manufactured with high mobility and stability
based on a self-aligned top-gate structure to drive high-end displays. In this study, the effect …

Correlation between Ti source/drain contact and performance of InGaZnO-based thin film transistors

KH Choi, HK Kim - Applied Physics Letters, 2013 - pubs.aip.org
Ti contact properties and their electrical contribution to an amorphous InGaZnO (a-IGZO)
semiconductor-based thin film transistor (TFT) were investigated in terms of chemical …

Effect of channel thickness on density of states in amorphous InGaZnO thin film transistor

SY Lee, DH Kim, E Chong, YW Jeon, DH Kim - Applied Physics Letters, 2011 - pubs.aip.org
We report on the origin of threshold voltage shift with the thickness of amorphous InGaZnO
channel layer deposited by rf magnetron sputter at room temperature, using density of states …

Design of InZnSnO semiconductor alloys synthesized by supercycle atomic layer deposition and their rollable applications

J Sheng, TH Hong, DH Kang, Y Yi… - ACS applied materials …, 2019 - ACS Publications
Amorphous InGaZnO semiconductors have been rapidly developed as active charge-
transport materials in thin film transistors (TFTs) because of their cost effectiveness …

Synaptic transistors with human brain-like fJ energy consumption via double oxide semiconductor engineering for neuromorphic electronics

SI Cho, JB Jeon, JH Kim, SH Lee, W Jeong… - Journal of Materials …, 2021 - pubs.rsc.org
Neuromorphic devices that mimic a human brain have attracted significant attention in the
field of next-generation semiconductors. The human brain can efficiently process information …