Current-driven degradation dynamics in GaN/InGaN multi-quantum-wells UV photodetectors fabricated with a high-quality Al2O3 passivation film

P Dalapati, T Egawa, M Miyoshi - Vacuum, 2023 - Elsevier
The degradation dynamics in GaN/InGaN multi-quantum-wells (MQWs) ultraviolet
photodetectors (UV-PDs) submitted to high current stress have been intensively …

doping in pulsed-laser-deposited - for device applications

S Vogt, C Petersen, H von Wenckstern… - Physical Review …, 2024 - APS
The feasibility of zirconium doping of α-Ga 2 O 3 grown by pulsed laser deposition is
demonstrated. Targets with different zirconium contents are used to adjust the zirconium …

Deposition and photoluminescence of zinc gallium oxide thin films with varied stoichiometry made by reactive magnetron co-sputtering

M Zubkins, E Strods, V Vibornijs, A Sarakovskis… - Journal of Alloys and …, 2024 - Elsevier
This paper reports on the deposition and photoluminescence of amorphous and crystalline
thin films of zinc gallium oxide with Ga: Zn atomic ratio varied between 0.3 and 5.7. The films …

Magnetron sputtering of liquid metals to quickly fabricate gallium-based nano electronic and semiconducting films

X Chen, L Tian, Z Xing, B Du, W Xiang, Q Wang… - Surfaces and …, 2024 - Elsevier
Abstract Gallium-based (Ga-based) thin films have a great number of applications in
sensors, ultraviolet light electronics and semiconductors. However, the high surface tension …

Impact of temperature and film thickness on α-and β-phase formation in Ga2O3 thin films grown on a-plane sapphire substrate

E Butanovs, M Zubkins, E Strods, V Vibornijs… - Thin Solid Films, 2024 - Elsevier
The metastable corundum gallium oxide (α-Ga 2 O 3) features advantageous properties in
comparison to the thermodynamically stable monoclinic β-Ga 2 O 3 phase, such as wider …

Reactive Sputter Deposition of Ga2O3 Thin Films Using Liquid Ga Target

M Gajdics, M Serényi, T Kolonits, A Sulyok, ZE Horváth… - Coatings, 2023 - mdpi.com
Ga2O3 is a promising material in the optoelectronics and semiconductor industry. In this
work, gallium oxide thin films were deposited via radio frequency (RF) sputtering, using a …

Reactive Sputter Deposition of Ga [sub. 2] O [sub. 3] Thin Films Using Liquid Ga Target.

M Gajdics, M Serényi, T Kolonits, A Sulyok… - Coatings (Basel …, 2023 - go.gale.com
Ga 2 O 3 is a promising material in the optoelectronics and semiconductor industry. In this
work, gallium oxide thin films were deposited via radio frequency (RF) sputtering, using a …